High isolation integrated inductor and method thereof

Abstract

An inductor having a first coil of metal trace configured in an open loop topology and placed in a first metal layer; a second coil of metal trace configured in an open loop topology and placed in the first metal layer; and a third coil of metal trace configured in a closed loop topology and placed in a second metal layer, wherein: the first coil of metal trace is laid out to be substantially symmetrical with respect to a first axis, the second coil of metal trace is laid out to be approximately a mirror image of the first coil of metal trace with respect to a second axis, and the third coil of metal trace is laid out to enclose a majority portion of both the first coil of metal trace and the second coil of metal trace from a top view perspective.

Dependencies are inferred from the claim text.