Manufacturing method for a micromechanical device including an oblique surface and corresponding micromechanical device

A method of manufacturing a micromechanical device t, the method comprising:

• providing a silicon substrate having a front side and a rear side, wherein a first normal of the front side deviates by a first angle from a <111> direction of the silicon substrate, a lateral offset between the first normal and the <111> direction thereby increasing in a first offset direction;
• forming a first trench and a second trench in the front side, the second trench being spaced apart from and essentially parallel to the first trench, and the first trench and the second trench extending along the first offset direction;
• forming a first etching mask on the front side, which covers the front side except for a first opening area situated between the first trench and the second trench;
• and
• anisotropically etching the front side, using the etching mask, thereby forming in the opening area an oblique surface having a second angle to the first normal, which approximately corresponds to the first angle.