Electrostatic doping of a layer of a conductive or non-conductive material

Process for controllably and reversibly electrostatically doping a conductive or non-conductive material that is deposited in the form of a layer on a solid substrate, wherein said process is carried out under vacuum, that said substrate is a glassy matrix, said process comprises at least the following steps:

• heating said glassy matrix including said layer of conductive or non-conductive material to a doping temperature (TD) ranging from 50° C. to 130° C.;
• applying an electric field between said glassy matrix and said conductive or non-conductive material having a voltage ranging from −300 V to +300 V, while maintaining the temperature at the doping temperature;
• cooling said glassy matrix including said layer of conductive or non-conductive material to an operating temperature (TU), said operating temperature being lower than 50° C.;
• said process being carried out on at least a portion of the surface of said conductive or non-conductive material.