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US 2018/0203352 A1Published application
Monomers, polymers and photoresist compositions
AssigneeRohm and Haas Electronic Materials Korea Ltd.
InventorsEui Hyun Ryu, Myung-Yeol Kim, Woo-Hyung Lee, Haemi Jeong, Kwang-Hwyi Im
Life of this patent
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Abstract
Monomers and polymers are provided that comprise a carbon alicyclic group or heteroalicyclic group that comprises 1) one or more acid-labile ring substituents and 2) one or more ether or thioether ring substituents. Photoresists that comprise such polymers also are provided.
Claims15
A polymer comprising a repeat unit that comprises:
- a carbon alicyclic or heteroalicyclic group that comprises 1) one or more acid-labile ring substituents and 2) one or more optionally substituted ether or optionally substituted thioether ring substituents.
A monomer comprising a structure of the following Formulae (I) or (I′):
- wherein in each of Formulae (I) and (I′):
- X and Y are independently C, O, or S and form a carbon alicyclic ring or heteroalicyclic ring;
- R is a non-hydrogen substituent;
- R1 is optionally substituted ether or optionally substituted thioether;
- R2 is a non-hydrogen substituent;
- m is an integer an integer of 0 or greater;
- n is a positive integer;
- and the sum of m and n do not exceed the available valances of the carbon alicyclic ring or heteroalicyclic ring.
5 more elements
A monomer comprising a structure of the following Formula (II):
- wherein in Formula (II):
- R is a non-hydrogen substituent;
- R1 is optionally substituted ether or optionally substituted thioether;
- R2 is a non-hydrogen substituent;
- m is an integer an integer of 0 (where no R2 groups are present) or greater;
- n is a positive integer;
- and the sum of m and n do not exceed the available valances of the carbon alicyclic ring or heteroalicyclic ring.
4 more elements
Dependencies are inferred from the claim text.