Gallium arsenide substrate and use thereof
AssigneeFreiberger Compound Materials GmbH
InventorsWolfram FLIEGEL, Christoph KLEMENT, Christa WILLNAUER, Max SCHEFFER-CZYGAN, André KLEINWECHTER, Stefan EICHLER, Berndt WEINERT, Michael MÄDER
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Abstract
The present invention relates to a novel provided gallium arsenide substrates as well as the use thereof. The gallium arsenide substrates provided according to the invention exhibit a so far not obtained surface quality, in particular a homogeneity of surface properties, which is detectable by means of optical surface analyzers, by way of example by means of ellipsometric lateral substrate mapping for optical contact-free quantitative characterization.
Claims14
A gallium arsenide substrate which exhibits at least one surface having, according to an ellipsometric lateral substrate mapping with an optical surface analyzer, a variation of a laterally resolved background-corrected measurement signal whose distribution percentile of 1% normalized to a substrate average of a phase shift signal is greater than −0.0065.
A gallium arsenide substrate which exhibits at least one surface having, according to an ellipsometric lateral substrate mapping with an optical surface analyzer, based on a substrate diameter of 150 mm as reference, a defect number of <6000 and/or a total defect area of less than 2 cm2, wherein a defect is defined as a continuous area of greater than 1000 μm2 having a deviation from the average measurement signal in ellipsometric lateral substrate mapping with an optical surface analyzer of at least ±0.05%.
Dependencies are inferred from the claim text.