High silica content substrate such as for use in thin-film battery
AssigneeCorning Incorporated
InventorsDaniel Warren Hawtof, Archit Lal
Life of this patent
Estimating the term…
Abstract
A high silica content substrate, such as for a thin-film battery, is provided. The substrate has a high silica content, such as over 90% by weight silica, and is thin, for example less than 500 μm. The substrate may include a surface with a topography or profile that facilitates bonding with a coating layer, such as a coating of an electrochemical battery material. The high silica content substrate may be flexible, have high temperature resistance, high strength and/or be non-reactive. The substrate may be suitable for use in the high temperature environments used in many chemical deposition or formation processes, such as electrochemical battery material formation processes.
Claims20
A fused quartz substrate comprising:
- a first major surface having a surface area greater than 1 mm2;
- a second major surface opposite the first major surface;
- an outer perimeter surface extending between the first major surface and the second major surface;
- at least 90% by weight silica;
- an average thickness between the first major surface and the second major surface of less than 500 μm;
- and
- a width and a length that are less each than 100 m and greater than 1 mm;
- a first group of a plurality of raised elongate features formed in the first major surface and extending in the direction of the width, wherein each raised elongate feature of the first group has a length and a width and the length is at least ten times larger than width, wherein the width of each elongate feature of the first group is between 10 mm and 2 μm;
- and
- a second group of a plurality of raised elongate features formed in the first major surface and extending in the direction of the length, wherein at least some of the raised elongate features of the second group intersect a raised elongate feature of the first group, wherein each raised elongate feature of the second group has a length and a width and the length is at least ten times larger than width, wherein the width of each elongate feature of the second group is between 10 mm and 2 μm;
- wherein at least some of the raised elongate features of the first group and of the second group extend from the surface a distance of at least 10 angstroms beyond the lowest portion of the first major surface;
- wherein the surface area of the first major surface is at least 1.5 times the area of the cross-sectional shape defined by the outer perimeter surface of the substrate.
A fused quartz substrate comprising:
- a first major surface having a surface area greater than 1 mm2;
- a second major surface opposite the first major surface;
- an outer perimeter surface extending between the first major surface and the second major surface;
- at least 99% by weight silica;
- an average thickness between the first major surface and the second major surface of less than 500 μm;
- and
- a width and a length that are less each than 100 m and greater than 1 mm;
- a first group of a plurality of raised elongate features formed in the first major surface and extending in the direction of the width, wherein each raised elongate feature of the first group has a length and a width and the length is at least ten times larger than width;
- and
- a second group of a plurality of raised elongate features formed in the first major surface and extending in the direction of the length, wherein at least some of the raised elongate features of the second group intersect a raised elongate feature of the first group, wherein each raised elongate feature of the second group has a length and a width and the length is at least ten times larger than width;
- wherein at least some of the raised elongate features of the first group and of the second group extend from the surface a distance of at least 10 angstroms beyond the lowest portion of the first major surface;
- wherein the surface area of the first major surface is at least 1.5 times the area of the cross-sectional shape defined by the outer perimeter surface of the substrate.
A fused quartz substrate comprising:
- a first major surface having a surface area greater than 1 mm2;
- a second major surface opposite the first major surface;
- an outer perimeter surface extending between the first major surface and the second major surface;
- at least 99% by weight silica;
- an average thickness between the first major surface and the second major surface of less than 500 μm;
- and
- a width and a length that are less each than 100 m and greater than 1 mm;
- a first group of a plurality of raised elongate features formed in the first major surface and extending in the direction of the width, wherein each raised elongate feature of the first group has a length and a width and the length is at least ten times larger than width, wherein the width of each elongate feature of the first group is between 10 mm and 2 μm;
- and
- a second group of a plurality of raised elongate features formed in the first major surface and extending in the direction of the length, wherein at least some of the raised elongate features of the second group intersect a raised elongate feature of the first group, wherein each raised elongate feature of the second group has a length and a width and the length is at least ten times larger than width, wherein the width of each elongate feature of the second group is between 10 mm and 2 μm;
- wherein at least some of the raised elongate features of the first group and of the second group extend from the surface a distance of at least 10 angstroms beyond the lowest portion of the first major surface.
A fused quartz substrate comprising:
- a first major surface having a surface area greater than 1 mm2;
- a second major surface opposite the first major surface;
- an outer perimeter surface extending between the first major surface and the second major surface;
- wherein the substrate is formed from a material of (SiO2)1-x-y.M′xM″y composition, where either or both of M′ and M″ is an element, dopant, or substitution, which may be in an oxide form, or combination thereof, or is omitted, and where the sum of x plus y is less than 1;
- an average thickness between the first major surface and the second major surface of less than 500 μm;
- and
- a width and a length that are less each than 100 m and greater than 1 mm;
- a first group of a plurality of raised elongate features formed in the first major surface and extending in the direction of the width, wherein each raised elongate feature of the first group has a length and a width and the length is at least ten times larger than width, wherein the width of each elongate feature of the first group is between 10 mm and 2 μm;
- and
- a second group of a plurality of raised elongate features formed in the first major surface and extending in the direction of the length, wherein at least some of the raised elongate features of the second group intersect a raised elongate feature of the first group, wherein each raised elongate feature of the second group has a length and a width and the length is at least ten times larger than width, wherein the width of each elongate feature of the second group is between 10 mm and 2 μm;
- wherein at least some of the raised elongate features of the first group and of the second group extend from the surface a distance of at least 10 angstroms beyond the lowest portion of the first major surface;
- wherein the surface area of the first major surface is at least 1.5 times the area of the cross-sectional shape defined by the outer perimeter surface of the substrate.
Dependencies are inferred from the claim text.