Electronic device and method for fabricating the same
AssigneeSK hynix Inc.
InventorsGa-Young Ha, Ki-Seon Park, Jong-Han Shin
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Abstract
A method for fabricating an electronic device including a semiconductor memory includes: forming an etching target layer over a substrate; forming an initial hard mask pattern including a carbon-containing material over the etching target layer; forming a hard mask pattern by doping an impurity which increases a hardness of the carbon-containing material into a surface portion of the initial hard mask pattern; and etching the etching target layer by using the hard mask pattern as an etching barrier.
Claims23
A method for fabricating an electronic device including a semiconductor memory, comprising:
- forming an etching target layer over a substrate;
- forming an initial hard mask pattern including a carbon-containing material over the etching target layer;
- forming a hard mask pattern by doping an impurity which increases a hardness of the carbon-containing material into a surface portion of the initial hard mask pattern;
- and
- etching the etching target layer by using the hard mask pattern as an etching barrier.
An electronic device comprising a semiconductor memory,
- wherein the semiconductor memory comprises:
- a substrate;
- and
- a variable resistance element formed over the substrate, and
- wherein at least a portion of a sidewall of the variable resistance element further contains Si or B compared to a remaining portion of the variable resistance element.
Dependencies are inferred from the claim text.