Special construct for continuous non-uniform active region finfet standard cells
AssigneeGlobalfoundries Inc.
InventorsNavneet JAIN, Juhan KIM, Andy NGUYEN, Mahbub RASHED
Life of this patent
Estimating the term…
Loading patent…
AssigneeGlobalfoundries Inc.
InventorsNavneet JAIN, Juhan KIM, Andy NGUYEN, Mahbub RASHED
Estimating the term…
Methods for abutting two cells with different sized diffusion regions and the resulting devices are provided. Embodiments include abutting a first cell having first drain and source diffusion regions and a second cell having second drain and source diffusion regions, larger than the first diffusion regions, by: forming a dummy gate at a boundary between the two cells; forming a continuous drain diffusion region having an upper portion crossing the dummy gate and encompassing the entire first drain diffusion region and part of the second drain diffusion region and having a lower portion beginning over the dummy gate and encompassing a remainder of the second drain diffusion region; forming a continuous source diffusion region that is the mirror image of the continuous drain diffusion region; and forming a poly-cut mask over the dummy gate between, but separated from, the continuous drain and source diffusion regions.
A device comprising:
A device comprising:
A device comprising:
Dependencies are inferred from the claim text.