Method of Forming Topcoat for Patterning
AssigneesMassachusetts Institute of Technology, The University of Chicago
InventorsDo Han Kim, Hyo Seon Suh, Priya Moni, Karen K. Gleason, Paul Franklin Nealey
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Abstract
Disclosed is a method for the fabrication of polymeric topcoat via initiated chemical vapor deposition (iCVD) or photoinitiated chemical vapor deposition (piCVD) in conjunction with directed self-assembly (DSA) of block copolymers to generate high resolution patterns. A topcoat deposited by iCVD or piCVD allows for conformal, ultra-thin, uniform, pinhole-free coatings. iCVD or piCVD topcoat enables the use of a diversity of block copolymer (BCP) materials for DSA and facilitates the direct and seamless integration of the topcoats for a pattern transfer process.
Claims28
A method of forming a topcoat on a block copolymer film, comprising the steps of:
- (a) heating or irradiating an initiator, thereby producing a gaseous free radical initiator;
- (b) contacting the block copolymer film with the gaseous free radical initiator and a gaseous monomer, thereby forming a cross-linked topcoat.
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An article, comprising a substrate, and a coating on the substrate, wherein the coating comprises a block copolymer film and a topcoat on the block copolymer, wherein the topcoat is deposited by iCVD or piCVD.
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Dependencies are inferred from the claim text.