Method for treating pattern structure, method for manufacturing electronic device, and treatment liquid for inhibiting collapse of pattern structure
AssigneeFUJIFILM Corporation
InventorsAtsushi MIZUTANI, Tadashi INABA
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Abstract
Provided are a method for treating a pattern structure which is capable of inhibiting collapse of a pattern structure, a method for manufacturing an electronic device including such a treatment method, and a treatment liquid for inhibiting collapse of a pattern structure. The method for treating a pattern structure includes applying a treatment liquid containing a fluorine-based polymer having a repeating unit containing a fluorine atom to a pattern structure formed of an inorganic material.
Claims20
A method for treating a pattern structure, comprising:
- applying a treatment liquid containing a fluorine-based polymer having a repeating unit containing a fluorine atom to the pattern structure formed of an inorganic material.
A treatment liquid for inhibiting collapse of a pattern structure, comprising:
- a fluorine-based polymer having a repeating unit containing a fluorine atom, wherein the treatment liquid is applied to the pattern structure formed of an inorganic material.
Dependencies are inferred from the claim text.