Charged Particle Beam Writing Apparatus, and Charged Particle Beam Writing Method
AssigneeNuFlare Technology, Inc.
InventorRieko Nishimura
Life of this patent
Estimating the term…
Abstract
A charged particle beam writing apparatus includes a number of shots calculation circuit to calculate the number of shots in the case where a deflection region is irradiated with a shot of a charged particle beam, a deflection position correcting circuit to correct a deflection position of the charged particle beam to be shot in the deflection region, depending on the number of shots to be shot in the deflection region, and a deflector to deflect the charged particle beam to a corrected deflected position on the target object.
Claims12
A charged particle beam writing apparatus comprising:
- a number of shots calculation circuit configured to calculate a number of shots in a case where a deflection region is irradiated with a shot of a charged particle beam;
- a deflection position correcting circuit configured to correct a deflection position of the charged particle beam to be shot in the deflection region, depending on the number of shots to be shot in the deflection region;
- and
- a deflector configured to deflect the charged particle beam to a corrected deflected position on a target object.
A charged particle beam writing method comprising:
- calculating a number of shots in a case where a deflection region is irradiated with a shot of a charged particle beam;
- correcting a deflection position of the charged particle beam to be shot in the deflection region, depending on the number of shots to be shot in the deflection region;
- and
- writing a pattern on a target object by deflecting the charged particle beam to a corrected deflection position on the target object.
A charged particle beam writing apparatus comprising:
- an area density calculation circuit configured to calculate an area density of a pattern arranged in each of a plurality of processing regions obtained by dividing a writing region of a target object by a size of an irradiation region which can be irradiated with whole multi charged particle beams;
- a correction circuit configured to correct a dose amount of a beam that causes a position deviation, using a change amount of an irradiation region shape of the multi charged particle beams in a processing region concerned in the plurality of processing regions which is produced depending on the area density of the each of the plurality of processing regions;
- and
- a writing mechanism configured to irradiate the processing region concerned on the target object by the multi charged particle beams of a corrected dose amount.
A charged particle beam writing method comprising:
- calculating an area density of a pattern arranged in each of a plurality of processing regions obtained by dividing a writing region of a target object by a size of an irradiation region which can be irradiated with whole multi charged particle beams;
- correcting a dose amount of a beam that causes a position deviation, using a change amount of an irradiation region shape of the multi charged particle beams in a processing region concerned in the plurality of processing regions which is produced depending on the area density of the each of the plurality of processing regions;
- and
- irradiating the processing region concerned on the target object by the multi charged particle beams of a corrected dose amount.
Dependencies are inferred from the claim text.