Method and Computer Program Product for Controlling the Positioning of Patterns on a Substrate in a Manufacturing Process

A method for controlling the positioning of patterns on a silicon substrate in a manufacturing process for a wafer, the method comprising the steps of:

• conducting at least one registration measurement with a registration tool on at least one pattern formed in at least one layer on the substrate by lithography in a previous lithography process step of the manufacturing process;
• determining from the registration measurement a position of the at least one pattern in a coordinate system for the manufacturing process;
• and
• feeding the determined position of the at least one pattern into an automatic process control of a manufacturing system for controlling a setup of the manufacturing system for a subsequent lithography process step of the manufacturing process.

A method for controlling the positioning of patterns on a silicon substrate in a manufacturing process for a wafer, the method comprising the steps of:

• forming at least one pattern in at least one layer on the substrate by lithography in a previous lithography process step of the manufacturing process;
• performing an etch process on the at least one layer on the substrate;
• conducting at least one registration measurement with a registration tool on at least one pattern formed in the at least one layer on the substrate;
• determining from the registration measurement a position of the at least one pattern in a coordinate system for the manufacturing process;
• collecting a first portion of complementary information;
• conducting at least one further process step;
• collecting a second portion of complementary information;
• feeding the determined position of the at least one pattern, the collected first portion of complementary information, and the collected second portion of complementary information into an automatic process control of a manufacturing system for controlling a setup of the manufacturing system for a subsequent lithography process step of the manufacturing process;
• and
• carrying out the subsequent lithography process step.