Liquid level control system and method
AssigneeMirle Automation Corporation
InventorsJung-Lung HUANG, Chin-Chang HUANG, Ying-Ju CHEN
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Abstract
The present invention provides a liquid level control system and method. The present invention achieves a uniformly soaking process of a substrate during different segments of a fixed time period, by using a liquid removal device to gradually remove a processing liquid from a tank. The substrate is disposed in the liquid in the tank to be wet processed. By the removal of the liquid from the tank via the liquid removal device, an area of the portion of the substrate being processed by the liquid can be gradually decreased whereby the substrate can be uniformly processed.
Claims16
A liquid level control system, for a substrate wet-process, comprising:
- a tank;
- a liquid stored in the tank;
- a fixing device being used to fix a substrate in the liquid, wherein the liquid is used to perform processes to a portion of the substrate, which is soaked in the liquid;
- and
- a liquid removal device being used to remove the liquid from the tank;
- wherein the portion of the substrate soaked in the liquid is reduced when the liquid is gradually removed from the tank.
A liquid level control method, for a substrate wet-process, comprising:
- disposing a tank having a liquid stored therein;
- fixing a substrate in the liquid by a fixing device, wherein the liquid is used to perform processes to at least a portion of the substrate, which is soaked in the liquid;
- and
- gradually removing the liquid from the tank by a liquid removal device, making the at least a portion of the substrate soaked in the liquid be reduced.
Dependencies are inferred from the claim text.