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US 2018/0092940 A1Published application
Compositions and methods to affect skin irritation
AssigneesAlumend, LLC, Wavepharma, LLC
InventorsRonald E. Utecht, Therese M. Downey, Miri Seiberg, Stanley S. Shapiro, Jack V. Foster, JR.
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Abstract
Compositions are described that contain treated chitosan, modified chitosan and/or modified and treated chitosan for use in formulations for skin, hair and nails, and in compositions and methods of reducing topical agent-induced skin irritation and inflammation.
Claims20
A composition comprising:
- (a) at least one topical irritating agent that causes skin irritation and/or IL-1α secretion, and (b) at least one chitosan covalently modified with an alkyl sulfonic acid via a sulfonamide linkage.
Dependencies are inferred from the claim text.