Method For Producing a Solar Cell, in Particular a Silicon Thin-Film Solar Cell
AssigneeLilas GmbH
InventorVitalij Lissotschenko
Life of this patent
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Abstract
A method for producing a solar cell, in particular a silicon thin-film solar cell, wherein a TCO layer (3) is applied to a glass substrate (1) and at least one silicon layer (4, 5) is applied to the TCO layer (3). Before the TCO layer (3) is applied, electron radiation is applied to the glass substrate (1), such that a light-scattering layer (2) of the glass substrate (1) is produced, to which light-scattering layer the TCO layer (3) is applied. Alternatively or additionally, a first silicon layer (4) may be applied to the TCO layer (3), a laser radiation or electron radiation may be applied to the first silicon layer (4), and a second silicon layer (5) may be applied to the irradiated first silicon layer (4).
Claims4
A method for producing a silicon thin-film solar cell, comprising the following method steps:
- depositing a TCO layer (3) on a glass substrate (1);
- depositing a first silicon layer (4) on the TCO layer (3);
- exposing the first silicon layer (4) to laser radiation or electron radiation;
- and
- depositing a second silicon layer (5) on the irradiated first silicon layer (4);
- wherein the second silicon layer (5) is deposited at temperatures below 300° C. to prevent temperature-induced impairment of the silicon thin-film solar cell being produced.
Dependencies are inferred from the claim text.