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US 2018/0059546 A1Published application
Silicon-containing underlayers
AssigneeRohm and Haas Electronic Materials LLC
InventorsLi Cui, Charlotte A. Cutler, Suzanne M. Coley, Owendi Ongayi, Christopher P. Sullivan, Paul J. LaBeaume, Shintaro Yamada, Mingqi Li, James F. Cameron
Life of this patent
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Abstract
Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising Si—O linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.
Claims20
A process comprising:
- (a) coating a substrate with a coating composition comprising one or more curable silicon-containing polymers comprising a backbone comprising Si—O linkages, and one or more organic blend polymers comprising as polymerized units one or more ethylenically unsaturated monomers having an acidic proton and having a pKa in water from −5 to 13, and one or more organic solvents to form a curable silicon-containing polymer layer on the substrate;
- (b) curing the silicon-containing polymer layer to form a siloxane underlayer;
- (c) disposing a layer of a photoresist on the siloxane underlayer;
- (d) pattern-wise exposing the photoresist layer to form a latent image;
- (e) developing the latent image to form a patterned photoresist layer having a relief image therein;
- (f) transferring the relief image to the substrate;
- and (g) removing the siloxane underlayer by wet stripping.
4 more elements
A composition comprising:
- one or more curable silicon-containing polymers comprising a backbone comprising Si—O linkages;
- and one or more organic blend polymers comprising as polymerized units one or more ethylenically unsaturated monomers having an acidic proton and having a pKa in water from −5 to 8.
Dependencies are inferred from the claim text.