# US 2018/0025904 A1 · Systems and Methods for Treating Substrates with Cryogenic Fluid Mixtures

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- Number: US 2018/0025904 A1
- Document ID: US20180025904A1
- Status: Published application
- Kind: A1
- Application number: 15/721,396
- Filed: 2017-09-29
- Published: 2018-01-25
- Earliest claimed: 2014-10-06
- Assignees: Tel Fsi, Inc.
- Applicants: TEL FSI, Inc.
- Inventors: David DeKraker
- Web page: https://patentgrep.com/patent/US20180025904A1

## CPC

- H10P 70/80: {Cleaning only by supercritical fluids}
- B08B 3/02: Cleaning by the force of jets or sprays
- B08B 5/02: Cleaning by the force of jets, e.g. blowing-out cavities {(airguns or nozzles per se B05B1/005)}
- B08B 7/0021: {by liquid gases or supercritical fluids}
- B08B 7/0092: {by cooling}
- H10P 70/10: {Cleaning before device manufacture, i.e. Begin-Of-Line process}
- H10P 70/27: {during, before or after processing of conductive materials, e.g. polysilicon or amorphous silicon layers}
- H10P 72/0414: {using mainly spraying means, e.g. nozzles}
- H10P 72/7618: {characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel}
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- B08B: CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL

## Abstract

Disclosed herein are systems and methods for treating the surface of a microelectronic substrate, and in particular, relate to an apparatus and method for scanning the microelectronic substrate through a cryogenic fluid mixture used to treat an exposed surface of the microelectronic substrate. The fluid mixture may be expanded through a nozzle to form an aerosol spray or gas cluster jet (GCJ) spray may impinge the microelectronic substrate and remove particles from the microelectronic substrate's surface. In one embodiment, the process conditions may be varied between subsequent treatments of a single substrate to target different types of particles with each treatment.

## Claims

### Claim 1

A method for treating a microelectronic substrate, comprising
receiving the microelectronic substrate in a vacuum process chamber comprising a fluid expansion component an inlet and an outlet;
maintaining a process pressure of 35 Torr or less in the vacuum process chamber;
receiving a fluid mixture to the fluid expansion component, the fluid mixture comprising nitrogen or argon, wherein the fluid mixture is at a temperature in the range from 70 K to 200 K and a pressure less than 800 psig;
maintaining the fluid mixture to the fluid expansion component and the vacuum process chamber under a first group of process conditions;
expanding the fluid mixture into the vacuum process chamber through the outlet such that the expanded fluid mixture flows across the microelectronic substrate;
removing a first plurality of objects from the microelectronic substrate using the fluid mixture that flows across the microelectronic substrate;
maintaining the fluid mixture to the fluid expansion component and the vacuum process chamber under a second group of process conditions where at least one process condition between the first group and the second group of process conditions are different;
expanding the fluid mixture into the vacuum process chamber through the outlet such that the expanded fluid mixture flows across the microelectronic substrate; and
removing a second plurality of objects from the microelectronic substrate using the fluid mixture that flows across the microelectronic substrate.

### Claim 2 (depends on 1)

The method of claim 1, wherein the first group of process conditions comprises a first fluid flow rate, and the second group of process conditions comprises a second fluid flow rate being different from the first fluid flow rate.

### Claim 3 (depends on 1)

The method of claim 1, wherein the first group of process conditions comprises a first fluid flow rate, and the second group of process conditions comprises a second fluid flow rate being higher than the first fluid flow rate.

### Claim 4 (depends on 1)

The method of claim 1, wherein the first group of process conditions comprises a first fluid flow rate, and the second group of process conditions comprises a second fluid flow rate being lower than the first fluid flow rate.

### Claim 5 (depends on 1)

The method of claim 1, wherein the first group of process conditions comprises a first fluid flow rate of about 100 slm, and the second group of process conditions comprises a second fluid flow rate of about 160 slm.

### Claim 6 (depends on 1)

The method of claim 1, wherein the first group of process conditions or the second group of process conditions comprises fluid flow rate of the fluid mixture, a chemical composition of the fluid mixture, a temperature of the fluid mixture, a fluid pressure of the fluid mixture, a distance between the microelectronic substrate and the fluid expansion component, or a chamber pressure of the vacuum process chamber.

### Claim 7 (depends on 1)

The method of claim 1, wherein the fluid mixture comprises nitrogen, argon, or a combination thereof.

### Claim 8 (depends on 1)

The method of claim 1, wherein the fluid mixture comprises at least a mixture of nitrogen or argon to one or more of the following: xenon, krypton, helium, hydrogen, C2H6 or carbon dioxide.

### Claim 9

A method for cleaning a microelectronic substrate, comprising
receiving the microelectronic substrate in a vacuum process chamber comprising a gas expansion component comprising an inlet and an outlet;
supplying, to the gas expansion component, a gas mixture comprising:
a temperature that is less than 273K;
a pressure that prevents liquid formation in the gas mixture in the gas expansion component; and
maintaining a first group of process conditions for the gas mixture and the vacuum process chamber;
positioning the substrate opposite the gas expansion component to provide a gap distance between the substrate and the outlet in the range from 2 mm to 50 mm, the gas expansion component being disposed opposite of the microelectronic substrate;
expanding the gas mixture into the process chamber through the gas expansion component outlet and through the gap such that at least a portion of the expanded gas mixture will flow across the microelectronic substrate;
moving the microelectronic substrate along a path that is adjacent to the gas expansion component for an initial treatment of the microelectronic substrate;
changing at least one process condition for the gas mixture or the vacuum process chamber for a subsequent treatment following the initial treatment of the microelectronic substrate.

### Claim 10 (depends on 9)

The method of claim 9, wherein the temperature is greater than or equal to 70K and less than or equal to 150K.

### Claim 11 (depends on 9)

The method of claim 9, wherein the process chamber is maintained at less than 10 Torr.

### Claim 12 (depends on 9)

The method of claim 9, wherein the positioning of the substrate comprises maintaining an incidence angle of 45° to 90° between the substrate and the gas expansion component.

### Claim 13 (depends on 9)

The method of claim 9, wherein the cooled and pressurized gas mixture comprises nitrogen, argon, or a combination thereof.

### Claim 14 (depends on 9)

The method of claim 9, wherein the cooled and pressurized gas mixture comprises at least a mixture of nitrogen or argon to one or more of the following: xenon, krypton, helium, hydrogen, C2H6 or carbon dioxide.

### Claim 15 (depends on 9)

The method of claim 9, wherein the changing of the process conditions comprises changing at least one process condition from an initial treatment of the microelectronic substrate for a subsequent treatment of the microelectronic substrate.

### Claim 16 (depends on 9)

The method of claim 9, wherein the changing of the process conditions comprises changing the gas flow rate to a higher magnitude for a subsequent treatment of the microelectronic substrate.

### Claim 17 (depends on 9)

The method of claim 9, wherein the changing of the process conditions comprises changing the gap distance for a subsequent treatment of the microelectronic substrate.

### Claim 18 (depends on 9)

The method of claim 9, wherein the changing of the process conditions comprises changing at least two of the following process conditions: a gas flow rate of the gas mixture, a chemical composition of the gas mixture, a temperature of the gas mixture, a gas pressure of the gas mixture, a distance between the microelectronic substrate and the gas expansion component, a chamber pressure of the vacuum process chamber, or any combination thereof.