# US 2018/0025894 A1 · Plasma processing apparatus and analysis method for analyzing plasma processing data > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2018/0025894 A1 - Document ID: US20180025894A1 - Status: Published application - Kind: A1 - Application number: 15/445,203 - Filed: 2017-02-28 - Published: 2018-01-25 - Earliest claimed: 2016-07-21 - Assignees: Hitachi High-Technologies Corporation - Applicants: Hitachi High-Technologies Corporation - Inventors: Ryoji ASAKURA; Daisuke SHIRAISHI; Akira KAGOSHIMA; Satomi INOUE - Web page: https://patentgrep.com/patent/US20180025894A1 ## CPC - H01J 37/32972: {Spectral analysis} - G01J 3/0264: {Electrical interface; User interface} - G01J 3/027: {Control of working procedures of a spectrometer; Failure detection; Bandwidth calculation} - G01J 3/28: Investigating the spectrum (using colour filters G01J3/51) - G01J 3/443: Emission spectrometry - H01J 2237/334: Etching - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) - G01J: MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY (light sources F21, H01J, H01K, H05B; investigating properties of materials by optical means G01N) ## Abstract According to the present invention, a plasma processing apparatus includes an analysis unit that obtains wavelengths of the light correlated with a plasma processing result, selects, from the obtained wavelengths, a wavelength having a first factor that represents a deviation in an intensity distribution of the light and is larger than a first predetermined value, and predicts the plasma processing result using the selected wavelength, or an analysis unit that obtains values computed using each of light intensities of a plurality of wavelengths and correlated with the plasma processing result, selects, from the obtained values, a value having a second factor that represents a deviation in a distribution of the obtained values and is larger than a second predetermined value, and predicts the plasma processing result using the selected value. ## Claims ### Claim 1 A plasma processing apparatus comprising: a processing chamber configured to perform processing using plasma; and an analysis unit configured to analyze data of light emitted from the plasma, wherein the analysis unit obtains wavelengths of the light correlated with a plasma processing result, selects, from the obtained wavelengths, a wavelength having a first factor that represents a deviation in an intensity distribution of the light and is larger than a first predetermined value, and predicts the plasma processing result using the selected wavelength, or the analysis unit obtains values computed using each of light intensities of a plurality of wavelengths and correlated with the plasma processing result, selects, from the obtained values, a value having a second factor that represents a deviation in a distribution of the obtained values and is larger than a second predetermined value, and predicts the plasma processing result using the selected value. ### Claim 2 (depends on 1) The plasma processing apparatus according to claim 1, wherein the first predetermined value is a value defined to allow a prediction error of a prediction formula obtained using the selected wavelength to be an allowable value. ### Claim 3 (depends on 1) The plasma processing apparatus according to claim 1, wherein the first factor is obtained using a standard deviation or a square of the standard deviation. ### Claim 4 (depends on 1) The plasma processing apparatus according to claim 1, wherein the first factor is obtained by dividing a standard deviation by an average value of the light intensity. ### Claim 5 (depends on 1) The plasma processing apparatus according to claim 1, wherein the first factor is a ratio between the standard deviations obtained from a pair of different groups of plasma processing samples. ### Claim 6 (depends on 1) The plasma processing apparatus according to claim 1, wherein the first factor includes a value obtained by dividing a standard deviation by an average value of the light intensity and a ratio of the standard deviations obtained from a pair of different groups of plasma processing samples. ### Claim 7 (depends on 1) The plasma processing apparatus according to claim 1, further comprising a control unit configured to control for adjusting a plasma processing condition on the basis of the predicted plasma processing result. ### Claim 8 (depends on 1) The plasma processing apparatus according to claim 1, further comprising a control unit configured to determine abnormality if the predicted plasma processing result exceeds a predetermined range. ### Claim 9 An analysis method for analyzing data on light emitted from plasma, comprising: a group of steps of: obtaining wavelengths of the light correlated with a plasma processing result; selecting, from the obtained wavelengths, a wavelength having a first factor that represents a deviation in an intensity distribution of the light and is larger than a first predetermined value; and predicting the plasma processing result using the selected wavelength, or a group of steps of: obtaining values computed using each of light intensities of a plurality of wavelengths and correlated with the plasma processing result; selecting, from the obtained values, a value having a second factor that represents a deviation in a distribution of the obtained values and is larger than a second predetermined value; and predicting the plasma processing result using the selected value. ### Claim 10 (depends on 9) The analysis method according to claim 9, wherein the first predetermined value is a value defined to allow a prediction error of a prediction formula for predicting the plasma processing result to be an allowable value. ### Claim 11 (depends on 9) The analysis method according to claim 9, wherein the first factor is obtained using a standard deviation or a square of the standard deviation. ### Claim 12 (depends on 9) The analysis method according to claim 9, wherein the first factor is obtained by dividing a standard deviation by an average value of the light intensity. ### Claim 13 (depends on 9) The analysis method according to claim 9, wherein the first factor is a ratio between the standard deviations obtained from a pair of different groups of plasma processing samples. ### Claim 14 (depends on 9) The analysis method according to claim 9, wherein the factor includes a value obtained by dividing a standard deviation by an average value of the light intensity and a ratio of the standard deviations obtained from a pair of different groups of plasma processing samples.