# US 2018/0025885 A1 · Composite charged particle beam device > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2018/0025885 A1 - Document ID: US20180025885A1 - Status: Published application - Kind: A1 - Application number: 15/548,321 - Filed: 2016-02-04 - Published: 2018-01-25 - Earliest claimed: 2015-02-06 - Assignees: Hitachi High-Technologies Corporation - Applicants: Hitachi High-Technologies Corporation - Inventors: Yuta IMAI; Hideo MORISHITA; Toshihide AGEMURA - Web page: https://patentgrep.com/patent/US20180025885A1 ## CPC - H01J 37/12: electrostatic - H01J 37/06: Electron sources; Electron guns - H01J 37/08: Ion sources; Ion guns - H01J 37/145: Combinations of electrostatic and magnetic lenses - H01J 37/20: Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support - H01J 37/28: with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} - H01J 2237/08: Ion sources - H01J 2237/121: characterised by shape - H01J 2237/244: Detection characterized by the detecting means - H01J 2237/2801: Details - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract This composite charged particle beam device comprises a first charged particle beam column (6), a second charged particle beam column (1) which is equipped with a deceleration system, and is equipped with a detector (3) inside the column, a test piece stage (10) on which a test piece (9) is placed, and an electric field correction electrode (13) which is provided around the tip of the first charged particle beam column, wherein the electric field correction electrode is an electrode that corrects the electric field distribution formed in the vicinity of the test piece, and the electric field correction electrode is positioned between the test piece and the first charged particle beam column, and on the opposite side from the second charged particle beam column with respect to the optical axis of the first charged particle beam column. ## Claims ### Claim 1 A composite charged particle beam device comprising: a sample table on which a sample is placed; an ion beam column; an electron beam column including a deceleration optical system and a detector in a column; and an electric field correction electrode provided around an end portion of the ion beam column, and that corrects an electric field distribution formed around the sample, wherein the electric field correction electrode is located between the sample and the ion beam column and at an opposite side of the electron beam column with respect to an optical axis of the ion beam column. ### Claim 2 (depends on 1) The composite charged particle beam device according to claim 1, further comprising an end electrode around the end portion of the electron beam column. ### Claim 3 (depends on 2) The composite charged particle beam device according to claim 2, wherein the end electrode has an axisymmetric shape with respect to the optical axis of the electron beam column. ### Claim 4 (depends on 1) The composite charged particle beam device according to claim 1, further comprising a control unit that controls a voltage applied to the electric field correction electrode, wherein the control unit controls a voltage applied to the electric field correction electrode based on a potential difference between the sample and the electron beam column. ### Claim 5 (depends on 2) The composite charged particle beam device according to claim 2, further comprising a control unit that controls a voltage applied to the electric field correction electrode and the end electrode, wherein the control unit controls a voltage applied to the end electrode and a voltage applied to the electric field correction electrode based on a potential difference between the sample and the electron beam column. ### Claim 6 (depends on 2) The composite charged particle beam device according to claim 2, wherein the electric field correction electrode and the end electrode are configured to apply the same voltage, and the electric field correction electrode and the end electrode are connected to a common voltage source. ### Claim 7 (depends on 1) The composite charged particle beam device according to claim 1, wherein a maximum value of an absolute value of a component of an electric field generated by the electron beam column and on the optical axis of the ion beam column in a direction perpendicular to the optical axis has a value of 50 kV/m or more. ### Claim 8 (depends on 1) The composite charged particle beam device according to claim 1, wherein the sample table is configured to be able to hold the surface of the sample in at least two directions, i.e., a direction opposing the optical axis of the ion beam column and a direction opposing the optical axis of the electron beam column. ### Claim 9 (depends on 1) The composite charged particle beam device according to claim 1, wherein an irradiation energy from the electron beam column is 0.1 to 2 keV, and a sample surface can be observed where an end of the electron beam column and a surface of the sample are away by a distance of 5 to 20 mm. ### Claim 10 (depends on 1) The composite charged particle beam device according to claim 1, wherein the electric field correction electrode includes a position moving mechanism for changing a position of the electrode. ### Claim 11 (depends on 1) The composite charged particle beam device according to claim 1, further comprising a control unit that controls a voltage applied to the electric field correction electrode, wherein when an ion beam from the ion beam column irradiates the sample, the control unit applies a first voltage to the electric field correction electrode, and when an electron beam from the electron beam column irradiates the sample, the control unit controls a second voltage to the electric field correction electrode. ### Claim 12 (depends on 11) The composite charged particle beam device according to claim 11, wherein the first voltage is set based on an irradiation position where the ion beam irradiates the sample, and the second voltage is set based on an irradiation position where the electron beam irradiates the sample and an intensity with the detector detecting a signal electron generated when the electron beam irradiates the sample. ### Claim 13 (depends on 1) The composite charged particle beam device according to claim 1, wherein the ion beam column is a focusing ion beam column, and the electron beam column is a scanning electron microscope column. ### Claim 14 (depends on 1) The composite charged particle beam device according to claim 1, wherein the deceleration optical system is a boosting optical system constituted by an electrode arranged along an objective lens in the electron beam column. ### Claim 15 (depends on 1) The composite charged particle beam device according to claim 1, wherein the deceleration optical system is a retarding optical system constituted by an electric power source applying a voltage to the sample or the sample table.