# US 2018/0024431 A1 · Polymer and positive resist composition

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- Number: US 2018/0024431 A1
- Document ID: US20180024431A1
- Status: Published application
- Kind: A1
- Application number: 15/549,752
- Filed: 2016-02-15
- Published: 2018-01-25
- Earliest claimed: 2015-02-20
- Assignees: Zeon Corporation
- Applicants: Zeon Corporation
- Inventors: Manabu HOSHINO
- Web page: https://patentgrep.com/patent/US20180024431A1

## CPC

- G03F 7/039: Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023)
- C08F 212/08: Styrene
- C08F 212/12: Monomers containing a branched unsaturated aliphatic radical or a ring substituted by an alkyl radical
- C09D 125/14: with unsaturated esters
- C08F 220/22: Esters containing halogen
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- C08F: MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C09D: COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR (cosmetics A61K; processes for applying liquids or other fluent materials to surfaces, in general, B05D; staining wood B27K5/02; glazes or vitreous enamels C03C; natural resins, French polish, drying-oils, driers, turpentine, per se, C09F; polishing compositions other than French polish, ski waxes C09G; adhesives or use of materials as adhesives C09J; materials for sealing or packing joints or covers C09K3/10; materials for stopping leaks C09K3/12; processes for the electrolytic or electrophoretic production of coatings C25D)

## Abstract

Provided are a polymer that can be favorably used as a positive resist having high sensitivity and a positive resist composition that can favorably form a resist film having excellent sensitivity. The polymer includes an α-methylstyrene unit and a methyl α-chloroacrylate unit, and the proportion of components having a molecular weight of greater than 80,000 in the polymer is no greater than 6.0%. The positive resist composition contains the aforementioned polymer and a solvent.

## Claims

### Claim 1

A polymer comprising an α-methylstyrene unit and a methyl α-chloroacrylate unit, wherein
a proportion of components having a molecular weight of greater than 80,000 is no greater than 6.0%.

### Claim 2 (depends on 1)

The polymer according to claim 1, having a molecular weight distribution (Mw/Mn) of at least 1.25.

### Claim 3 (depends on 1)

A positive resist composition comprising the polymer according to claim 1 and a solvent.

### Claim 4 (depends on 2)

A positive resist composition comprising the polymer according to claim 2 and a solvent.