# US 2018/0024375 A1 · Reticle with reduced transmission regions for detecting a defocus condition in a lithography process > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2018/0024375 A1 - Document ID: US20180024375A1 - Status: Published application - Kind: A1 - Application number: 15/724,488 - Filed: 2017-10-04 - Published: 2018-01-25 - Earliest claimed: 2015-06-19 - Assignees: SanDisk Technologies LLC - Applicants: SanDisk Technologies LLC - Inventors: Akihiro Tobioka - Web page: https://patentgrep.com/patent/US20180024375A1 ## CPC - G03F 7/70641: {Focus} - G02B 5/0278: {used in transmission} - G02B 27/32: Fiducial marks and measuring scales within the optical system - G03F 1/44: Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS ## Abstract A reticle for a semiconductor lithography process includes a glass plate having regions with a reduced optical transmission factor. The regions may include arrays of elements comprising defects such as cracks or voids which are formed by laser pulses. The regions may be adjacent to openings in an opaque material at the bottom of the reticle to shield the openings from a portion of the light which illuminates the reticle from the top. As a result, the light which exits the reticle and is used to pattern a substrate has an asymmetric intensity. This allows the substrate to be patterned with an inspection mark which indicates whether a defocus condition exists, and whether there is a positive or negative defocus condition. Related methods use a reticle to form a pattern on a substrate and for adjusting a focus condition using a reticle. ## Claims ### Claim 1 A method for patterning, comprising: forming a first mark on a surface of a wafer using a pattern in a reticle, the reticle comprising a glass plate and an opaque material on a bottom surface of the glass plate, the opaque material comprising a first opening of the pattern, the forming the first mark comprises illuminating a top surface of the glass plate using a light source and an illumination lens, wherein light from the light source passes through the glass plate, exits the glass plate at the first opening and illuminates a projection lens before reaching the surface of the wafer, the light exiting the glass plate via the first opening has an asymmetric intensity due to attenuation of the light from the light source at a region of the glass plate on one side of the first opening; and based on a position of the first mark on the surface of the wafer, determining whether a focal plane of light reaching the surface of the wafer via the projection lens is above or below the surface of the wafer. ### Claim 2 (depends on 1) The method of claim 1, wherein: the attenuation of the light is caused by the region of the glass plate having a reduced transmission factor relative to a surrounding region of the glass plate. ### Claim 3 (depends on 2) The method of claim 2, wherein: the reduced transmission factor is along a first optical path in the glass plate, the first optical path extends between the top surface and the first opening, at a non-perpendicular angle relative to the bottom surface of the glass plate. ### Claim 4 (depends on 2) The method of claim 2, wherein: the region of the glass plate having the reduced transmission factor extends upwardly in the glass plate from the bottom surface of the glass plate at the one side of the first opening. ### Claim 5 (depends on 2) The method of claim 2, wherein: the region of the glass plate having the reduced transmission factor comprises a plurality of elements having a refractive index different than a refractive index of a surrounding region of the glass plate; and the plurality of elements are arranged in a plurality of arrays. ### Claim 6 (depends on 5) The method of claim 5, wherein: each array is at a different height in the glass plate and comprises rows of the elements, the rows extending laterally in the glass plate. ### Claim 7 (depends on 5) The method of claim 5, wherein: each element is elongated along a height of the glass plate. ### Claim 8 (depends on 1) The method of claim 1, further comprising: forming a second mark on the surface of the wafer using the pattern in the reticle, the opaque material comprising a second opening, the forming the second mark comprises illuminating the top surface of the glass plate using the light source and the illumination lens, wherein light from the light source passes through the glass plate, exits the glass plate at the second opening and illuminates the projection lens before reaching the surface of the wafer, wherein: the light existing the glass plate via the second opening has a symmetric intensity; and the determining whether the focal plane is above or below the surface of the wafer is based on a position of the first mark relative to the second mark. ### Claim 9 (depends on 1) The method of claim 1, further comprising: forming a second mark on the surface of the wafer using the pattern in the reticle, the opaque material comprising a second opening, the forming the second mark comprises illuminating the top surface of the glass plate using the light source and the illumination lens, wherein light from the light source passes through the glass plate, exits the glass plate at the second opening and illuminates the projection lens before reaching the surface of the wafer, wherein: the light exiting the glass plate via the second opening has an asymmetric intensity due to attenuation of the light from the light source at a region of the glass plate on one side of the second opening; the asymmetric intensity of the light exiting the glass plate via the first opening is opposite to the asymmetric intensity of the light exiting the glass plate via the second opening; and the determining whether the focal plane is above or below the surface of the wafer is based on a position of the first mark relative to the second mark.