# US 2018/0022133 A1 · Method of manufacturing imprint stamp and display apparatus manufactured using the imprint stamp

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- Number: US 2018/0022133 A1
- Document ID: US20180022133A1
- Status: Published application
- Kind: A1
- Application number: 15/628,083
- Filed: 2017-06-20
- Published: 2018-01-25
- Earliest claimed: 2016-07-19
- Assignees: Samsung Display Co., Ltd.
- Applicants: Samsung Display Co., Ltd.
- Inventors: Min-Uk KIM; Moonjung AN; Dongeon LEE; Kang Soo HAN; Gugrae JO
- Web page: https://patentgrep.com/patent/US20180022133A1

## CPC

- B41K 1/50: Stamping surfaces impregnated with ink, or made of material leaving a mark after stamping contact
- B41K 1/04: with multiple stamping surfaces; with stamping surfaces replaceable as a whole
- B82Y 10/00: Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
- G02B 5/3058: {comprising electrically conductive elements, e.g. wire grids, conductive particles}
- G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping}
- B82Y 40/00: Manufacture or treatment of nanostructures
- B41K: STAMPS; STAMPING OR NUMBERING APPARATUS OR DEVICES (marking meat A22C17/10; embossing combined with printing B41F19/00; selective printing mechanisms B41J; embossing decorations or marks B44B5/00; marking or coding completed packages B65B61/26; ticket printing and issuing, fare registering, nonprinting aspects of franking apparatus G07B)
- B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)

## Abstract

A method of manufacturing an imprint stamp including forming an imprint resist only in a second area of a sample substrate including a first area and the second area, pressing the imprint resist with the imprint stamp and curing the imprint resist, in which the imprint stamp includes a fine protrusion pattern that corresponds to the first area and the second area of the sample substrate, and separating the imprint stamp from the sample substrate such that a portion of the fine protrusion pattern corresponding to the second area is separated from the imprint stamp by the cured imprint resist.

## Claims

### Claim 1

A method of manufacturing an imprint stamp, the method comprising:
forming an imprint resist only in a second area of a sample substrate, the sample substrate comprising a first area and the second area;
pressing the imprint resist with the imprint stamp and curing the imprint resist, the imprint stamp comprising a fine protrusion pattern that corresponds to the first area and the second area of the sample substrate; and
separating the imprint stamp from the sample substrate such that a portion of the fine protrusion pattern corresponding to the second area is separated from the imprint stamp by the cured imprint resist.

### Claim 2 (depends on 1)

The method of claim 1, wherein the fine protrusion pattern has the same pattern as a wire grid pattern.

### Claim 3 (depends on 2)

The method of claim 2, wherein a pitch of the fine protrusion pattern is 50 nm to 150 nm.

### Claim 4 (depends on 2)

The method of claim 2, wherein the sample substrate comprises a sample pattern in the second area.

### Claim 5 (depends on 4)

The method of claim 4, wherein:
the sample substrate comprises a display substrate of a display apparatus; and
the sample pattern comprises a black matrix pattern of the display apparatus.

### Claim 6 (depends on 5)

The method of claim 5, wherein a line width of the sample pattern is at least 10 μm.

### Claim 7 (depends on 1)

The method of claim 1, wherein the imprint resist comprises at least one of thermosetting resin and photocurable resin.

### Claim 8 (depends on 7)

The method of claim 7, wherein the fine protrusion pattern of the imprint stamp is formed by curing the at least one of the thermosetting resin and photocurable resin.

### Claim 9 (depends on 8)

The method of claim 8, wherein the imprint resist and the fine protrusion pattern comprise the same material.

### Claim 10 (depends on 1)

The method of claim 1, wherein in the step of separating the imprint stamp from the sample substrate, a process condition is set such that a bonding force between the cured imprint resist and the fine protrusion pattern is:
greater than a releasing force between the cured imprint resist and the fine protrusion pattern; and
greater than strength of a structure of the fine protrusion pattern.

### Claim 11 (depends on 1)

The method of claim 1, wherein the imprint resist is formed only in the second area using an inkjet method.

### Claim 12 (depends on 11)

The method of claim 11, wherein the imprint resist contacts the sample substrate.

### Claim 13 (depends on 11)

The method of claim 11, wherein:
a sample pattern is formed in the second area of the sample substrate; and
the imprint resist is disposed on the sample pattern.

### Claim 14

A method of manufacturing an imprint stamp, the method comprising:
forming an imprint resist in a second area of a sample substrate, the sample substrate comprising a first area and the second area;
pressing the imprint resist with the imprint stamp and curing the imprint resist, the imprint stamp comprising a fine protrusion pattern corresponding to the first area and the second area of the sample substrate; and
separating the imprint stamp from the sample substrate such that the cured imprint resist in the second area is attached to the fine protrusion pattern and separated from the sample substrate.

### Claim 15 (depends on 14)

The method of claim 14, wherein the sample substrate further comprises:
a reversal pattern disposed in the first area; and
an imprint resist layer covering the reversal pattern and disposed in the first area and in the second area of the sample substrate.

### Claim 16 (depends on 14)

The method of claim 14, wherein:
the fine protrusion pattern has the same pattern as a wire grid polarizer;
a pitch of the fine protrusion pattern is 50 nm to 150 nm, and
a width of the second area is at least 10 μm.

### Claim 17 (depends on 14)

The method of claim 14, wherein the imprint resist layer is directly formed only in the second area of the sample substrate using an inkjet method.

### Claim 18

A display apparatus comprising:
a substrate; and
a first layer disposed on the substrate and comprising a first area and a second area;
a wire grid polarizer pattern and a black matrix pattern for blocking light disposed in the first area and the second area, respectively; and
a plurality of tracks disposed on a surface of the black matrix pattern in a direction parallel to an extending direction of a fine line of the wire grid polarizer pattern,
wherein a distance between the tracks is equal to, or is integral multiples of, a pitch of the wire grid polarizer pattern.

### Claim 19 (depends on 18)

The display apparatus of claim 18, wherein the track comprises a groove formed in the direction parallel to the extending direction of the fine line of the wire grid polarizer pattern.

### Claim 20 (depends on 19)

The display apparatus of claim 19, wherein:
a width of the black matrix pattern is at least 10 μm; and
the pitch of the fine protrusion pattern is 50 nm to 150 nm.