# US 2018/0021987 A1 · Imprint template, detection method and detection device > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2018/0021987 A1 - Document ID: US20180021987A1 - Status: Published application - Kind: A1 - Application number: 15/650,016 - Filed: 2017-07-14 - Published: 2018-01-25 - Earliest claimed: 2016-07-25 - Assignees: Boe Technology Group Co., Ltd. - Applicants: Boe Technology Group Co., Ltd. - Inventors: Feng GUAN; Jikai YAO; Yingtao WANG; Xiaolong HE; Tingting ZHOU - Web page: https://patentgrep.com/patent/US20180021987A1 ## CPC - B29C 37/0053: {Moulding articles characterised by the shape of the surface, e.g. ribs, high polish (mould construction therefor B29C33/42; surface shaping of articles B29C59/00; by incorporating filler in or near the surface B29C70/64)} - B29C 43/003: {characterised by the choice of material} - B81C 1/0046: {using stamping, e.g. imprinting (nanoimprinting for making etch masks G03F7/0002)} - G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping} - G03B 2217/242: Details of the marking device - B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING (making preforms B29B11/00; making laminated products by combining previously unconnected layers which become one product whose layers will remain together B32B37/00 - B32B41/00) - B81C: PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS (making microcapsules or microballoons B01J13/02; processes or apparatus specially adapted for the manufacture or treatment of piezoelectric, electrostrictive or magnetostrictive elements per se H10N30/01) - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - G03B: APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR (optical parts of such apparatus G02B; photosensitive materials or processes for photographic purposes G03C; apparatus for processing exposed photographic materials G03D) ## Abstract The embodiments of the present disclosure provide an imprint template, a detection method and a detection device. The imprint template includes a first region and a second region located in the periphery of the first region. The first region is provided with a first imprint structure configured to imprint a first film layer pattern into a base material in a product region of a target substrate. The second region is provided with a second imprint structure configured to imprint a second film layer pattern into the base material in the periphery of the product region of the target substrate. And the second film layer pattern is used for assessing imprint quality of the first film layer pattern. ## Claims ### Claim 1 An imprint plate, comprising: a first region; a second region located in the periphery of the first region; a first imprint structure provided in the first region and configured to imprint a first film layer pattern into a base material in a product region of a target substrate; and a second imprint structure provided in the second region and configured to imprint a second film layer pattern into the base material in the periphery of the product region of the target substrate, the second film layer pattern being used for assessing imprint quality of the first film layer pattern. ### Claim 2 (depends on 1) The imprint template according to claim 1, wherein the first imprint structure has a first imprint pattern corresponding to the first film layer pattern, and the second imprint structure has a second imprint pattern corresponding to the second film layer pattern; and the second imprint pattern has a groove depth larger than that of the first imprint pattern. ### Claim 3 (depends on 2) The imprint template according to claim 2, wherein the pattern imprinted by the second imprint structure has an area larger than that of the pattern imprinted by the first imprint structure. ### Claim 4 (depends on 2) The imprint template according to claim 2, wherein areas of cross-sections of the second imprint pattern are gradually reduced in a depth direction of the second imprint pattern. ### Claim 5 (depends on 3) The imprint template according to claim 3, wherein areas of cross-sections of the second imprint pattern are gradually reduced in a depth direction of the second imprint pattern. ### Claim 6 (depends on 2) The imprint template according to claim 2, wherein the second imprint pattern is of a cone shape. ### Claim 7 (depends on 3) The imprint template according to claim 3, wherein the second imprint pattern is of a cone shape. ### Claim 8 A method for detecting imprint quality, applied to a target substrate imprinted by using an imprint template, wherein the imprint template comprises: a first region; a second region located in the periphery of the first region; a first imprint structure provided in the first region and configured to imprint a first film layer pattern into a base material in a product region of the target substrate; and a second imprint structure provided in the second region and configured to imprint a second film layer pattern into the base material in the periphery of the product region of the target substrate, the second film layer pattern being used for assessing imprint quality of the first film layer pattern, the method comprising steps of: measuring shape data of the second film layer pattern on the target substrate; determining a completion degree of imprinting the second film layer pattern based on the measured shape data; and assessing the imprint quality of the first film layer pattern in the product region of the target substrate based on the completion degree of imprinting the second film layer pattern. ### Claim 9 (depends on 8) The method according to claim 8, wherein the first imprint structure of the imprint template has a first imprint pattern corresponding to the first film layer pattern, and the second imprint structure of the imprint template has a second imprint pattern corresponding to the second film layer pattern, and the second imprint pattern has a groove depth larger than that of the first imprint pattern; the shape data is the height of the second film layer pattern; the step of determining the completion degree of imprinting the second film layer pattern based on the measured shape data comprises: comparing the measured height of the second film layer pattern with the groove depth of the second imprint pattern to determine the completion degree of imprinting the second film layer pattern. ### Claim 10 (depends on 8) The method according to claim 8, wherein areas of cross-sections of the second imprint pattern are gradually reduced in a depth direction of the second imprint pattern; the shape data is an area of a cross-section of a top portion of the second film layer pattern; the step of determining the completion degree of imprinting the second film layer pattern based on the measured shape data comprises: comparing the measured area of the cross-section of the top portion of the second film layer pattern with an opening area of the second imprint pattern to determine the completion degree of imprinting the second film layer pattern. ### Claim 11 (depends on 8) The method according to claim 8, wherein the step of assessing the imprint quality of the first film layer pattern in the product region of the target substrate based on the completion degree of imprinting the second film layer pattern comprises: determining the imprint quality of the first film layer pattern in the product region of the target substrate is acceptable if the completion degree of imprinting the second film layer pattern reaches a target threshold, or determining the imprint quality of the first film layer pattern in the product region of the target substrate is unacceptable. ### Claim 12 (depends on 9) The method according to claim 9, wherein the step of assessing the imprint quality of the first film layer pattern in the product region of the target substrate based on the completion degree of imprinting the second film layer pattern comprises: determining the imprint quality of the first film layer pattern in the product region of the target substrate is acceptable if the completion degree of imprinting the second film layer pattern reaches a target threshold, or determining the imprint quality of the first film layer pattern in the product region of the target substrate is unacceptable. ### Claim 13 (depends on 10) The method according to claim 10, wherein the step of assessing the imprint quality of the first film layer pattern in the product region of the target substrate based on the completion degree of imprinting the second film layer pattern comprises: determining the imprint quality of the first film layer pattern in the product region of the target substrate is acceptable if the completion degree of imprinting the second film layer pattern reaches a target threshold, or determining the imprint quality of the first film layer pattern in the product region of the target substrate is unacceptable. ### Claim 14 A device for detecting imprint quality, applied to a target substrate imprinted by using an imprint template, wherein the imprint template comprises a first region; a second region located in the periphery of the first region; a first imprint structure provided in the first region and configured to imprint a first film layer pattern into a base material in a product region of a target substrate; and a second imprint structure provided in the second region and configured to imprint a second film layer pattern into the base material in the periphery of the product region of the target substrate, the second film layer pattern being used for assessing imprint quality of the first film layer pattern, the device comprising: a measuring circuit configured to measure shape data of the second film layer pattern on the target substrate; a determining circuit configured to determine the completion degree of imprinting the second film layer pattern based on the measured shape data; and an assessing circuit configured to assess the imprint quality of the first film layer pattern in the product region of the target substrate based on the completion degree of imprinting the second film layer pattern. ### Claim 15 (depends on 14) The device according to claim 14, wherein the first imprint structure of the imprint template has a first imprint pattern corresponding to the first film layer pattern, and the second imprint structure of the imprint template has a second imprint pattern corresponding to the second film layer pattern, and the second imprint pattern has a groove depth larger than that of the first imprint pattern; the shape data is the height of the second film layer pattern; the determining circuit comprises: a first determining circuit configured to compare the measured height of the second film layer pattern with the groove depth of the second imprint pattern to determine the completion degree of imprinting the second film layer pattern. ### Claim 16 (depends on 14) The device according to claim 14, wherein areas of cross-sections of the second imprint pattern are gradually reduced in a depth direction of the second imprint pattern; the shape data is an area of a cross-section of a top portion of the second film layer pattern; the determining circuit comprises: a second determining circuit configured to compare the measured area of the cross-section of the top portion of the second film layer pattern with an opening area of the second imprint pattern to determine the completion degree of imprinting the second film layer pattern. ### Claim 17 (depends on 14) The device according to claim 14, wherein the assessing circuit is configured to determine the imprint quality of the first film layer pattern in the product region of the target substrate is acceptable if the completion degree of imprinting the second film layer pattern reaches a target threshold, or determine the imprint quality of the first film layer pattern in the product region of the target substrate is unacceptable. ### Claim 18 (depends on 15) The device according to claim 15, wherein the assessing circuit is configured to determine the imprint quality of the first film layer pattern in the product region of the target substrate is acceptable if the completion degree of imprinting the second film layer pattern reaches a target threshold, or determine the imprint quality of the first film layer pattern in the product region of the target substrate is unacceptable. ### Claim 19 (depends on 16) The device according to claim 16, wherein the assessing circuit is configured to determine the imprint quality of the first film layer pattern in the product region of the target substrate is acceptable if the completion degree of imprinting the second film layer pattern reaches a target threshold, or determine the imprint quality of the first film layer pattern in the product region of the target substrate is unacceptable. ### Claim 20 (depends on 15) The device according to claim 15, wherein both the first imprint pattern and the second imprint pattern are hyperfine nanometer scale imprint patterns.