# US 2018/0021802 A1 · Mask assembly for testing a deposition process, deposition apparatus including the mask assembly, and testing method for a deposition process using the mask assembly

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- Number: US 2018/0021802 A1
- Document ID: US20180021802A1
- Status: Published application
- Kind: A1
- Application number: 15/722,987
- Filed: 2017-10-02
- Published: 2018-01-25
- Earliest claimed: 2012-09-04
- Assignees: Samsung Display Co., Ltd.
- Applicants: Samsung Display Co., Ltd.
- Inventors: Min Ho Kim; You Min Cha; Seuk Hwan Park
- Web page: https://patentgrep.com/patent/US20180021802A1

## CPC

- C23C 14/042: {using masks}
- B05C 3/20: for applying liquid or other fluent material only at particular parts of the work (B05C3/02 takes precedence)
- C23C 14/46: by ion beam produced by an external ion source
- C23C 14/52: Means for observation of the coating process
- C23C 14/542: {Controlling the film thickness or evaporation rate}
- C23C 14/568: {Transferring the substrates through a series of coating stations (C23C14/562 takes precedence)}
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- B05C: APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (spraying apparatus, atomising apparatus, nozzles B05B; plant for applying liquids or other fluent materials to objects by electrostatic spraying B05B5/08)

## Abstract

A deposition apparatus includes deposition sources, a deposition chamber, a mask assembly, and a transfer unit. The mask assembly includes a support member, a shutter member, and a drive member. The support member has a first opening configured to allow the deposition materials to pass through while supporting the base substrate on which the passed-through deposition materials are deposited. The shutter member is accommodated in the support member and has a second opening smaller than the first opening. The drive member is configured to change a position of the second opening with respect to the base substrate in accordance with the movement of the mask assembly.

## Claims

### Claim 1

A mask assembly comprising:
a support member having a first opening configured to allow deposition materials to pass through, the support member being configured to support the base substrate on which a portion of the passed-through deposition materials are deposited;
a shutter member accommodated in the support member, the shutter member having a second opening smaller than the first opening and configured to allow the portion of the passed-through deposition materials to pass through and deposit on the base substrate; and
a drive member including a plurality of pinions,
wherein a first pinion of the plurality of pinions contacts a side surface of the shutter member and a second pinion of the plurality of pinions is coupled to the first pinion and is configured to engage with transfer racks to change the position of the second opening with respect to the base substrate.

### Claim 2 (depends on 1)

The mask assembly of claim 1, wherein the support member comprises:
a bottom portion having the first opening; and
a sidewall bent from the bottom portion to support the base substrate.

### Claim 3 (depends on 2)

The mask assembly of claim 2, wherein the second opening is configured to move with respect to the base substrate in a direction opposite to the first direction in accordance with the movement of the mask assembly.

### Claim 4 (depends on 3)

The mask assembly of claim 3, wherein the second opening extends in a second direction substantially perpendicular to the first direction.

### Claim 5 (depends on 2)

The mask assembly of claim 2, wherein the shutter member has a larger area than the first opening and is located on the bottom portion.

### Claim 6 (depends on 2)

The mask assembly of claim 2, further comprising:
a rail unit located on the bottom portion; and
a coupling unit coupled to the shutter member and inserted into the rail unit to allow the shutter member to move along the rail unit.

### Claim 7 (depends on 1)

The mask assembly of claim 1, wherein the shutter member comprises sawteeth on the side surface of the shutter member and configured to engage sawteeth of the first pinion.