# US 2018/0021747 A1 · Method for fluidizing copper silicide and process for preparing a halosilane using the method

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- Number: US 2018/0021747 A1
- Document ID: US20180021747A1
- Status: Published application
- Kind: A1
- Application number: 15/541,583
- Filed: 2016-03-15
- Published: 2018-01-25
- Earliest claimed: 2015-03-24
- Assignees: Dow Corning Corporation
- Applicants: Dow Corning Corporation
- Inventors: Mark Berglund; Aaron Coppernoll; Patrick James Harder; Dimitris Katsoulis; Vladimir Pushkarev
- Web page: https://patentgrep.com/patent/US20180021747A1

## CPC

- B01J 8/1836: {Heating and cooling the reactor (B01J8/42 takes precedence)}
- B01J 8/1818: {Feeding of the fluidising gas (B01J8/44 takes precedence)}
- B01J 8/1827: {the fluidising gas being a reactant}
- C01B 33/06: Metal silicides (alloys C22)
- C01B 33/1071: {Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof}
- B01J 2208/00407: outside the reactor bed
- B01J 2208/0053: Controlling multiple zones along the direction of flow, e.g. pre-heating and after-cooling
- B01J 2208/00681: Agglomeration
- B01J 2208/00805: Details of the particulate material
- B01J: CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- C01B: NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; {METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C}

## Abstract

A method is useful for maintaining a uniformly fluidized bed in a fluidized bed apparatus. The method includes the steps of charging a mixture of particles including copper silicide particles and fluidization additive particles into the fluidized bed apparatus, and uniformly fluidizing the particles at a temperature of at least 400° C. in the fluidized bed apparatus.

## Claims

### Claim 1

A method maintaining a uniformly fluidized bed in a fluidized bed apparatus comprises:
(A) heating, at a temperature of at least 400° C., a mixture of particles comprising greater than 80 weight % to less than 100% copper silicide particles and greater than 0 to 20 weight % fluidization additive particles in the fluidized bed apparatus, and
(B) feeding a fluid into the fluidized bed apparatus at a velocity sufficient to maintain uniform fluidization.

### Claim 2 (depends on 1)

The method of claim 1, where the copper silicide particles have a particle size of 10 μm to 150 μm.

### Claim 3 (depends on 1)

The method of claim 1, where the additive particles are present in an amount of greater than 0 weight % to 10 weight %, based on total weight of the mixture.

### Claim 4 (depends on 1)

The method of claim 1, where the copper silicide particles are present in an amount of 95 weight % to 98 weight % of the mixture, and the fluidization additive particles are present in an amount of 2 weight % to 5 weight % of the mixture.

### Claim 5 (depends on 1)

The method of claim 1, where the copper silicide is selected from the group consisting of (i) Cu7Si, (ii) Cu5Si, (iii) Cu4Si, and (iv) Cu3Si, and a mixture of two or more of (i), (ii), (iii), (iv).

### Claim 6 (depends on 1)

The method of claim 1, where the copper silicide comprises Cu5Si.

### Claim 7 (depends on 1)

The method of claim 1, where the copper silicide has empirical formula CubSicCrdCoeFefIrgNihPdiPtjRekRum, where subscripts b, c, d, e, f, g, h, i, j, k, and m represent the molar amounts of each element present, and b>0, c>0, d≧0, e≧0, f≧0, g≧0, h≧0, i≧0, j≧0, k≧0, and m≧0; with the provisos that at least one of d, e, f, g, h, l, j, k and m is not 0.

### Claim 8 (depends on 1)

The method of claim 1, where the fluidization additive particles are selected from the group consisting of silicon particles, silica particles and silicon carbide particles.

### Claim 9 (depends on 8)

The method of claim 8, where the fluidization additive particles are silica particles.

### Claim 10 (depends on 8)

The method of claim 8, where the fluidization additive particles are silicon carbide particles.

### Claim 11 (depends on 1)

The method of claim 1, where the temperature in step (B) is at least 500° C.

### Claim 12 (depends on 11)

The method of claim 11, where the temperature in step (B) is 500° C. to 750° C.

### Claim 13 (depends on 1)

The method of claim 1, where the temperature in step (B) is 400° C. to 750° C.

### Claim 14 (depends on 1)

The method of claim 1, where the method is used in a process for preparing a halosilane.