Magnetic material sputtering target and method for producing same
AssigneeJX Nippon Mining & Metals Corporation
InventorAtsutoshi Arakawa
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Abstract
A magnetic material sputtering target formed from a sintered body containing at least Co and/or Fe and B, and containing B in an amount of 10 to 50 at %, wherein an oxygen content is 100 wtppm or less. Since the magnetic material sputtering target of the present invention can suppress the generation of particles caused by oxides, the present invention yields superior effects of being able to improve the yield upon producing magnetoresistive films and the like.
Claims11
A magnetic material sputtering target formed from a sintered body containing at least Co and/or Fe and B, and containing B in an amount of 10 to 50 at %, wherein a total content of Al and Si is 100 wtppm or less, and an oxygen content is 100 wtppm or less.
A magnetic material sputtering target formed from a sintered body containing at least Co and/or Fe and B, and containing B in an amount of 10 to 50 at %, wherein a total content of Al, Ba, Hf, Li, Mg, Si, Sr, Ti and Zr is 100 wtppm or less, and an oxygen content is 100 wtppm or less.
A method of producing a magnetic material sputtering target, wherein a Co raw material and/or an Fe raw material and a B raw material are subject to melting and casting to prepare an alloy ingot, the alloy ingot is thereafter subject to gas atomization to prepare a raw material powder, and the raw material powder is thereafter sintered to obtain a target, and wherein the target is formed from a sintered body containing at least Co and/or Fe and B, and containing B in an amount of 10 to 50 at %, wherein a total content of Al and Si is 100 wtppm or less, and an oxygen content is 100 wtppm or less.
A method of producing a magnetic material sputtering target, wherein a Co raw material and/or an Fe raw material and a B raw material are subject to melting and casting to prepare an alloy ingot, the alloy ingot is thereafter subject to gas atomization to prepare a raw material powder, and the raw material powder is thereafter sintered to obtain a target, and wherein the target is formed from a sintered body containing at least Co and/or Fe and B, and containing B in an amount of 10 to 50 at %, wherein a total content of Al, Ba, Hf, Li, Mg, Si, Sr, Ti and Zr is 100 wtppm or less, and an oxygen content is 100 wtppm or less.
Dependencies are inferred from the claim text.