Method of manufacturing solar cell
AssigneePanasonic Intellectual Property Management Co., Ltd.
InventorKeiichiro MASUKO
Life of this patent
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Abstract
A method of manufacturing a solar cell includes: providing an insulating layer on a semiconductor layer provided on at least a part of a principle surface of a semiconductor substrate; providing a mask layer on the insulating layer; removing a part of the mask layer by laser irradiation so as to form a first opening through which the insulating layer is exposed; and removing, by an etching agent, the insulating layer exposed through the first opening so as to form a second opening through which the semiconductor layer is exposed.
Claims8
A method of manufacturing a solar cell comprising:
- providing an insulating layer on a semiconductor layer provided on at least a part of a principle surface of a semiconductor substrate;
- providing a mask layer on the insulating layer;
- removing a part of the mask layer by laser irradiation so as to form a first opening through which the insulating layer is exposed;
- and
- removing, by an etching agent, the insulating layer exposed through the first opening so as to form a second opening through which the semiconductor layer is exposed.
Dependencies are inferred from the claim text.