Method of optimizing an interface for processing of an organic semiconductor
AssigneeDpix, LLC
InventorsRobert Rodriquez, Shawn Michael O'Rourke, Michael Robert Johnson, Sanjeev Tandon
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Abstract
A method of forming an organic semiconductor includes forming a thin film transistor (“TFT”) backplane; forming a pixel well over the TFT backplane using a photoresist; performing a first plasma etch of the pixel well; stripping the photoresist in the pixel well; performing a second plasma etch of the pixel well; performing a first wash of the pixel well; exposing the pixel well to ultraviolet light; performing a second wash of the pixel well; and forming an organic photodiode in the pixel well.
Claims20
A method of forming an organic semiconductor comprising:
- forming a thin film transistor (“TFT”) backplane;
- forming a pixel well over the TFT backplane using a photoresist;
- performing a first plasma etch of the pixel well;
- stripping the photoresist in the pixel well;
- performing a second plasma etch of the pixel well;
- performing a first wash of the pixel well;
- exposing the pixel well to ultraviolet light;
- performing a second wash of the pixel well;
- and
- forming an organic photodiode in the pixel well.
A method of forming an organic semiconductor comprising:
- forming a thin film transistor (“TFT”) backplane;
- forming a pixel well over the TFT backplane using a photoresist;
- performing a plasma etch of the pixel well;
- stripping the photoresist in the pixel well;
- performing a residue rinse of the pixel well;
- performing a first wash of the pixel well;
- exposing the pixel well to ultraviolet light;
- performing a second wash of the pixel well;
- and
- forming an organic photodiode in the pixel well.
Dependencies are inferred from the claim text.