Activation method for silicon substrates
AssigneeAtotech Deutschland GmbH
InventorsChristof SUCHENTRUNK, Christian SCHWARZ
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Abstract
The present invention relates to an activation composition for activation of silicon substrates, which is an aqueous solution comprising a source of palladium ions, a source of fluoride ions and at least two aromatic acids. The present invention further relates to a method for its use and optionally for subsequent metallization of such treated substrates. The method can be employed in semiconductor and solar cell manufacturing.
Claims21
An activation composition for activation of silicon substrates wherein the activation composition is an aqueous solution comprising a source of palladium ions and a source of fluoride ions characterized in that it further comprises at least two aromatic acids selected from the group consisting of aromatic carboxylic acids, aromatic sulphonic acids, aromatic sulphinic acids, aromatic phosphonic acids and aromatic phosphinic acids.
Dependencies are inferred from the claim text.