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US 2018/0019118 A1Published application
Pattern forming method and heating apparatus
AssigneeTokyo Electron Limited
InventorsMakoto MURAMATSU, Takahiro KITANO, Tadatoshi TOMITA, Keiji TANOUCHI
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Abstract
The present invention, when forming a pattern on a substrate, forms a film of a block copolymer containing at least two polymers on the substrate, heats the film of the block copolymer under a solvent vapor atmosphere to subject the block copolymer to phase separation, and removes one of the polymers in the film of the phase-separated block copolymer, thereby accelerating fluidization of the polymers of the block copolymer to enable acceleration of the phase separation.
Claims9
1-8. (canceled)
A heating apparatus for heating a substrate, comprising:
- a mounting table which is disposed in a container and on which the substrate, on which a film of a block copolymer is to be formed, is mounted;
- a heating unit which is embedded in the mounting table and heats the substrate mounted on the mounting table;
- a solvent vapor supply unit which supplies gas containing vapor of a solvent into the container;
- and
- an ejection unit which ejects the gas in the container.
2 more elements
Dependencies are inferred from the claim text.