Method for rf power distribution in a multi-zone electrode array
AssigneeTokyo Electron Limited
InventorsSergey Voronin, Alok Ranjan
Life of this patent
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Abstract
Embodiments of systems and methods for RF power distribution in a multi-zone electrode array are described. A system may include a plasma source configured to generate a plasma field. Also, the system may include an RF power source coupled to the plasma source and configured to supply RF power to the plasma source. The system may also include a source controller coupled to the RF power source and configured to control modulation of the RF power supplied to the plasma source to enhance uniformity of a plasma field generated by the plasma source.
Claims21
A system for plasma processing, comprising:
- a plasma source configured to generate a plasma field;
- a Radio Frequency (RF) power source coupled to the plasma source and configured to supply RF power to the plasma source;
- and
- a source controller coupled to the RF power source and configured to control modulation of the RF power supplied to the plasma source to enhance uniformity of a plasma field generated by the plasma source.
A method for plasma processing, comprising:
- providing a plasma source configured to generate a plasma field, the plasma source having a first electrode assembly having a plurality of source electrodes and a second electrode assembly having a plurality of ring-shaped source electrodes;
- supplying High Frequency (HF) Radio Frequency (RF) power to the first electrode assembly and Low Frequency (LF) RF power to the second electrode assembly with a RF power source;
- selectably applying RF power to the each of the plurality of source electrodes in the first electrode assembly independently with a first multiplexer coupled to the first electrode assembly;
- selectably applying RF power to the each of the plurality of source electrodes in the second electrode assembly independently with a second multiplexer coupled to the second electrode assembly;
- and
- controlling modulation of the RF power supplied to the plasma source to enhance uniformity of a plasma field generated by the plasma source with a source controller coupled to the first multiplexer and to the second multiplexer.
Dependencies are inferred from the claim text.