Plasma processing apparatus

A plasma processing apparatus, comprising:

• a vessel which comprises a reaction chamber, wherein atmosphere within the reaction chamber is capable of being depressurized;
• a lower electrode which supports an object to be processed within the reaction chamber;
• a dielectric member which comprises a first surface and a second surface opposite to the first surface, and which closes an opening of the vessel such that the first surface opposes an outside of the reaction chamber and the second surface opposes the object to be processed;
• and
• a coil which opposes the first surface of the dielectric member, and which generates plasma within the reaction chamber,
• wherein the dielectric member has a groove having an annular shape and formed in the first surface of the dielectric member, and
• wherein at least a part of the coil is disposed in the groove, and
• wherein a depth of the groove increases stepwise from an inner circumference of the groove toward an outer circumference of the groove.