Sample observation method and sample observation device
AssigneeHitachi High-Technologies Corporation
InventorsMinoru HARADA, Yuji TAKAGI, Takehiro HIRAI
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AssigneeHitachi High-Technologies Corporation
InventorsMinoru HARADA, Yuji TAKAGI, Takehiro HIRAI
Estimating the term…
An inspection method uses a charged particle microscope to observe a sample and view a defect site or a circuit pattern. A plurality of images is detected by a plurality of detectors and a mixed image is generated by automatically adjusting and mixing weighting factors required when the plurality of images are synthesized with each other. The sample is irradiated and scanned with a charged particle beam so that the plurality of detectors arranged at different positions from the sample detects a secondary electron or a reflected electron generated from the sample. The mixed image is generated by mixing the plurality of images of the sample with each other for each of the plurality of detectors, which are obtained by causing each of the plurality of detectors arranged at the different positions to detect the secondary electron or the reflected electron. The generated mixed image is displayed on a screen.
A sample observation method for observing a sample by using a charged particle microscope, the method comprising:
A sample observation method for observing a sample by using a charged particle microscope, the method comprising:
A sample observation device for observing a sample by using a charged particle microscope, the device comprising:
Dependencies are inferred from the claim text.