Writing Guide

A writing guide comprising:

• a mask, said mask being substantially rectangularly shaped, said mask having a top, a bottom and opposing sides, said opposing sides being separated by from fifteen to thirty centimeters, said opposing sides being separated by from twenty to twenty five centimeters, said opposing sides being separated by from twenty three to twenty four centimeters, said mask being from forty to eighty millimeters thick, said mask being from fifty to seventy millimeters thick, said mask being from sixty to sixty five millimeters thick, said mask being substantially transparent, said mask comprising plastic;
• an aperture positioned through said mask, said aperture being substantially rectangularly shaped, said aperture having a top edge, a bottom edge and opposing side edges, said aperture being substantially centrally positioned in said mask, said aperture being sized such that said opposing side edges are substantially alignable with the side edges of a sheet of lined paper, said opposing side edges being separated by from sixteen to twenty eight centimeters, said opposing side edges being separated by from twenty one to twenty four centimeters, said opposing side edges being separated by from twenty two to twenty three centimeters;
• and
• a tab coupled to said bottom of said mask, wherein said tab is positioned on said mask such that said tab is configured for positioning of one or more of a user's fingers on said tab to facilitate repositioning of said mask relative to the sheet of lined paper, said tab being substantially centrally positioned on said bottom, said tab being substantially rectangularly shaped, said tab being substantially transparent;
• wherein said mask is configured for positioning over a sheet of lined paper, such that said top edge and said bottom edge of said aperture are alignable with respective lines of the sheet of lined paper, wherein a first writing space of the sheet of lined paper is accessible to a writing instrument positioned through said aperture, wherein said mask covers at least one writing space above and one writing space below the first writing space, such that a user is restricted to writing in the first writing space until said mask is repositioned relative to the sheet of lined paper.