Imprint apparatus and method of manufacturing article
AssigneeCanon Kabushiki Kaisha
InventorYoshihiro Shiode
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Abstract
The present invention provides an imprint apparatus comprising a deforming unit configured to deform a pattern surface by applying a force to a mold, a measuring unit configured to measure a deformation amount of the pattern surface, a control unit configured to control the measuring unit to measure the deformation amount in each of a plurality of states in which a plurality of the forces are applied to the mold, a calculation unit configured to calculate a rate of change in the deformation amount as a function of a change in the force applied to the mold, and a calibration unit configured to calibrate a control profile describing a time in the imprint process, and the force applied to the mold, based on the rate of change in the deformation amount.
Claims20
1-9. (canceled)
An imprint method of forming a pattern of an imprint material on a substrate using a mold having a pattern surface, the method comprising:
- measuring a deformation amount of the pattern surface in each of a plurality of states in which a plurality of first forces are applied to the mold;
- obtaining a rate of change in the deformation amount of the pattern surface as a function of a change in the first force applied to the mold, based on a relationship between each of the plurality of first forces applied to the mold and the deformation amount of the pattern surface corresponding to each of the plurality of first forces;
- and
- obtaining a relationship between a first force applied to the mold and a distance from the substrate to the pattern surface, based on the obtained rate of change, so that the deformation amount of the pattern surface becomes a target amount.
An imprint method of performing an imprint process of bringing an imprint material on a substrate into contact with a pattern surface of a mold, curing the imprint material, and separating the mold from the cured imprint material, thereby forming a pattern of the imprint material on the substrate, the method comprising:
- measuring a deformation amount of the pattern surface in each of a plurality of states in which a plurality of first forces are applied to the mold;
- obtaining a rate of change in the deformation amount of the pattern surface as a function of a change in the first force applied to the mold, based on a relationship between each of the plurality of first forces applied to the mold and the deformation amount of the pattern surface corresponding to each of the plurality of first forces;
- and
- obtaining a relationship between a first force applied to the mold and a time in the imprint process, based on the obtained rate of change, so that the deformation amount of the pattern surface becomes a target amount.
An imprint method of forming a pattern of an imprint material on a substrate using a mold having a pattern surface, the method comprising:
- measuring a deformation amount of the pattern surface in each of a plurality of states in which a plurality of first forces are applied to the mold;
- obtaining a rate of change in the deformation amount of the pattern surface as a function of a change in the first force applied to the mold, based on a relationship between each of the plurality of first forces applied to the mold and the deformation amount of the pattern surface corresponding to each of the plurality of first forces;
- and
- updating a control profile indicating a relationship between a first force applied to the mold and a distance from the substrate to the pattern surface, based on the obtained rate of change, so that the deformation amount of the pattern surface becomes a target amount.
An imprint method of performing an imprint process of bringing an imprint material on a substrate into contact with a pattern surface of a mold, curing the imprint material, and separating the mold from the cured imprint material, thereby forming a pattern of the imprint material on the substrate, the method comprising:
- measuring a deformation amount of the pattern surface in each of a plurality of states in which a plurality of first forces are applied to the mold;
- obtaining a rate of change in the deformation amount of the pattern surface as a function of a change in the first force applied to the mold, based on a relationship between each of the plurality of first forces applied to the mold and the deformation amount of the pattern surface corresponding to each of the plurality of first forces;
- and
- updating a control profile indicating a relationship between a first force applied to the mold and a time in the imprint process, based on the obtained rate of change, so that the deformation amount of the pattern surface becomes a target amount.
Dependencies are inferred from the claim text.