Back to results
US 2018/0006220 A1Published application
Nanoparticle with plural functionalities, and method of forming the nanoparticle
AssigneeInternational Business Machines Corporation
InventorsQing CAO, Kangguo CHENG, Zhengwen LI, Fei LIU
Life of this patent
Estimating the term…
Abstract
A nanoparticle includes a cuboid base including a semiconductor material, and a plurality of surfaces formed on the base and including a plurality of functionalities, respectively.
Claims21
A nanoparticle comprising:
- a cuboid base comprising a semiconductor material;
- and
- a plurality of surfaces formed on the base and including a plurality of functionalities, respectively.
5-6. (canceled)
A method of forming a nanoparticle, comprising:
- forming a layer of semiconductor material on a substrate;
- forming a first layer on the semiconductor material, the first layer having a functionality different from a functionality of the semiconductor material;
- patterning the layer of semiconductor material to form a pillar of the semiconductor material;
- and
- separating the pillar from the substrate to form the nanoparticle.
2 more elements
A method of forming a nanoparticle, comprising:
- forming a layer of semiconductor material on a buried oxide layer of a semiconductor-on-insulator (SOI) substrate;
- forming a first layer on the semiconductor material, the first layer having a functionality different from a functionality of the semiconductor material;
- patterning the layer of semiconductor material to form a pillar of the semiconductor material, the patterning of the layer of semiconductor material comprising:
- a first etch to form a plurality of strips of the semiconductor material;
- and
- a second etch to divide the plurality of strips into a plurality of pillars of the semiconductor material;
- and
- etching the buried oxide layer to separate the pillar from the buried oxide layer to form the nanoparticle.
5 more elements
Dependencies are inferred from the claim text.