US 2018/0006164 A1 · OPTO-ELECTRONIC DEVICE WITH TEXTURED SURFACE AND METHOD OF MANUFACTURING THEREOF

Abstract

Disclosed is an opto-electronic device including a semiconducting substrate, a layered interface including at least one layer, the layered interface having a first surface in contact with a surface of the semiconducting substrate and the layered interface being adapted for passivating the surface of the semiconducting substrate, the layered interface having a second surface and the layered interface being adapted for electrically insulating the first surface from the second surface, and a textured surface structure including a plurality of nanowires and a transparent dielectric coating, the textured surface structure being in contact with the second surface of the layered interface, the plurality of nanowires protruding from the second surface and the plurality of nanowires being embedded between the second surface and the transparent dielectric coating.

Claims21

Dependent claims

1-15. (canceled)

Method of fabricating an optoelectronic device comprising the steps of:

a) Providing a semiconducting substrate having a surface;
b) Forming a layered interface comprising at least one layer on said substrate surface, said layered interface having a first surface in contact with said surface of said semiconducting substrate and said layered interface being adapted for passivating said surface of said semiconducting substrate, said layered interface having a second surface and said layered interface being adapted for electrically insulating said first surface from said second surface;
c) Forming a plurality of nanowires protruding from said second surface of said layered interface, said nanowires having a height comprised between 20 nanometers and 200 nanometers;
and
d) Forming a transparent dielectric coating, having a thickness comprised between 20 nanometers and 200 nanometers, on the plurality of nanowires, so that said plurality of nanowires is embedded between said second surface of said layered interface and said transparent dielectric coating, so that said nanowires coated by said dielectric coating having a height comprised between 20 nanometers and 200 nanometers.

2 more elements

Dependencies are inferred from the claim text.

Facts

Application

15/537,754Filed 21 Dec 2015

Priority

EP 14307132.222 Dec 2014

Published

4 Jan 2018

Term ends

Not estimatedThe source records don’t support an estimate.

Classification8 codes

H10F 77/70
Constructional details of devices covered by this subclass: surface textures, e.g. pyramid structures
H10F 71/129
Manufacture or treatment of devices covered by this subclass: passivating
H10F 77/315
For photovoltaic cells: the coatings being antireflective or having enhancing optical properties
H10F 77/413
Optical elements or arrangements: directly associated or integrated with the devices, e.g. back reflectors

Opto-electronic device with textured surface and method of manufacturing thereof

Life of this patent

Opto-electronic device with textured surface and method of manufacturing thereof

Life of this patent

Abstract

Claims21