Array of optoelectronic structures and fabrication thereof

A method of fabrication an array of optoelectronic structures, comprising:

• providing a crystalline substrate with a template structure thereon, wherein the template structure comprises cells corresponding to individual optoelectronic structures to be obtained, each of the cells comprising an opening to the substrate;
• growing several first layer portions of a first compound semiconductor material from seeds in each said opening, for each of said first layer portions to a least partly fill a respective one of the cells and form an essentially planar film portion therein;
• growing several, second layer portions of a second compound semiconductor material over said first layer portions, for neighboring ones of said second layer portions to coalesce and thereby form a coalescent film extending over said first layer portions;
• and
• removing excess portions of materials extending over one or more portions of the substrate corresponding to lateral boundaries of the cells, wherein each of the optoelectronic structures comprises a stack of:
• a residual portion of one of said second layer portions;
• and a residual portion of one of said first layer portions, the stack protruding from the substrate,
• wherein the substrate provided is a CMOS-fabricated substrate that comprises wires integrated in the substrate, wherein at least some of the wires are arranged so as to be in electrical contact with the one or more lower portions of the template structure.