Trench mosfet device and the preparation method thereof
AssigneeAlpha and Omega Semiconductor Incorporated
InventorsXiaobin Wang, Madhur Bobde, Paul Thorup
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AssigneeAlpha and Omega Semiconductor Incorporated
InventorsXiaobin Wang, Madhur Bobde, Paul Thorup
Estimating the term…
A trench-type metal-oxide-semiconductor field-effect transistor (MOSFET) device and a fabrication method are disclosed. The trench MOSFET device comprises a semiconductor substrate of a first conductivity type. The semiconductor substrate has a plurality of first trenches arranged side by side in a first preset area of the semiconductor substrate extending along a first direction and a plurality of second trenches arranged side by side in a second preset area of the semiconductor substrate extending along a second direction perpendicular to the first direction. A control gate is formed in each of the pluralities of first and second trenches. A body region of a second conductivity type is formed at a top portion of the semiconductor substrate near sidewalls of the pluralities of first and second trenches. A source region of the first conductivity type is formed on a top portion of the body region.
A trench metal-oxide-semiconductor field-effect transistor (MOSFET) device comprising:
7-14. (canceled)
A trench metal-oxide-semiconductor field-effect transistor (MOSFET) strip layout wafer comprises
A trench metal-oxide-semiconductor field-effect transistor (MOSFET) device comprising:
Dependencies are inferred from the claim text.