Esc ceramic sidewall modification for particle and metals performance enhancements
AssigneeLam Research Corporation
InventorEric A. Pape
Life of this patent
Estimating the term…
Abstract
A substrate support for a substrate processing system includes a baseplate and a ceramic layer arranged on the baseplate. The ceramic layer includes a lower surface, an upper surface configured to support a substrate, and sidewalls around a perimeter of the ceramic layer extending from the lower surface to the upper surface, and the ceramic layer comprises a first material. A bond layer is provided between the baseplate and the ceramic layer. A protective layer is formed on the sidewalls of the ceramic layer. The protective later comprises a second material different from the first material.
Claims19
A substrate support for a substrate processing system, the substrate support comprising:
- a baseplate;
- a ceramic layer arranged on the baseplate, wherein the ceramic layer includes a lower surface, an upper surface configured to support a substrate, and sidewalls around a perimeter of the ceramic layer extending from the lower surface to the upper surface, and wherein the ceramic layer comprises a first material;
- a bond layer provided between the baseplate and the ceramic layer;
- and
- a protective layer formed on the sidewalls of the ceramic layer, wherein the protective later comprises a second material different from the first material.
A method for forming a substrate support for a substrate processing system, the method comprising:
- providing a baseplate;
- depositing a bond layer on the baseplate;
- arranging a ceramic layer on the baseplate, wherein the ceramic layer includes a lower surface, an upper surface configured to support a substrate, and sidewalls around a perimeter of the ceramic layer extending from the lower surface to the upper surface, and wherein the ceramic layer comprises a first material;
- and
- at least one of
- forming a protective layer on the sidewalls of the ceramic layer, wherein the protective later comprises a second material different from the first material,
- polishing the sidewalls of the ceramic layer, and
- acid-etching the sidewalls of the ceramic layer.
Dependencies are inferred from the claim text.