System and method for substrate support feed-forward temperature control based on rf power

A method of operating a temperature controller for a substrate support in a substrate processing system, the method comprising:

• receiving at a first interface of the temperature controller a bias power signal and a plasma signal, wherein the bias power signal indicates a bias radio frequency (RF) power level of a first RF generator for the substrate support, and wherein the plasma signal indicates a plasma RF power level of a second RF generator;
• receiving at a second interface of the temperature controller a temperature signal, wherein the temperature signal indicates a temperature of the substrate support;
• generating (i) a first compensation value based on a bias feed-forward transfer function and the bias RF power level, and (ii) a second compensation value based on a plasma feed-forward transfer function and the plasma RF power level;
• generating an error signal based on a set point temperature and the temperature of the substrate support;
• generating a control signal based on the error signal;
• and
• controlling an actuator to adjust the temperature of the substrate support based on the first compensation value, the second compensation value and the control signal.

The method of 15, further comprising:

• receiving the bias RF power signal and the plasma RF power signal from a RF generating system via a third interface at a system controller;
• and
• forwarding the bias RF power signal and the plasma RF power signal from a system controller to the temperature controller via a fourth interface,
• wherein the first interface, the third interface and the fourth interface are Ethernet for control automation technology (EtherCAT) interfaces.