Manufacturing method for insulation layer, manufacturing method for array substrate and array substrate
AssigneeShenzhen China Star Optoelectronics Technology Co., Ltd.
InventorDeyong FAN
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Abstract
A manufacturing method for insulation layer, a manufacturing method for array substrate and an array substrate are disclosed. Wherein, the manufacturing method for insulation layer comprises steps of: depositing an insulation layer on a substrate; exposing and developing the insulation layer in order to obtain the insulation layer having an opening; light curing the insulation layer having the opening; and performing a high-temperature annealing treatment to the insulation layer having the opening after being light cured. Adopting the manufacturing method for insulation layer of the present invention, a situation of deformation at the opening of the insulation layer can be reduced.
Claims15
A manufacturing method for insulation layer, wherein, the manufacturing method comprises following steps:
- depositing an insulation layer on a substrate;
- exposing and developing the insulation layer in order to obtain the insulation layer having an opening;
- light curing the insulation layer having the opening;
- and
- performing a high-temperature annealing treatment to the insulation layer having the opening after being light cured.
A manufacturing method for an array substrate, wherein, a step of forming an insulation layer is provided between steps of forming a data line and a common electrode line, and the step of forming the insulation layer comprises:
- depositing an insulation layer on a substrate;
- exposing and developing the insulation layer in order to obtain the insulation layer having an opening;
- light curing the insulation layer having the opening;
- and
- performing a high-temperature annealing treatment to the insulation layer having the opening after being light cured.
An array substrate, wherein the array substrate is manufactured by a manufacturing method, and the manufacturing method comprises:
- a step of forming an insulation layer is provided between steps of forming a data line and a common electrode line, and the step of forming the insulation layer comprises:
- depositing an insulation layer on a substrate;
- exposing and developing the insulation layer in order to obtain the insulation layer having an opening;
- light curing the insulation layer having the opening;
- and
- performing a high-temperature annealing treatment to the insulation layer having the opening after being light cured.
Dependencies are inferred from the claim text.