Method for operation instability detection in a surface wave plasma source
AssigneeTokyo Electron Limited
InventorsSergey Voronin, Jason Marion, Alok Ranjan
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Abstract
Provided are methods and systems for operation instability detection in a surface wave plasma source. In an embodiment a system for plasma processing may include a surface wave plasma source configured to generate a plasma field. The system may also include an optical sensor configured to generate information characteristic of optical energy collected in a region proximate to the surface wave plasma source. Additionally, the system may include a sensor logic unit configured to detect a region of instability proximate to the surface wave plasma source in response to the information generated by the optical sensor.
Claims21
A system for plasma processing comprising:
- a surface wave plasma source configured to generate a plasma field;
- an optical sensor configured to generate information characteristic of optical energy collected in a region proximate to the surface wave plasma source;
- and
- a sensor logic unit configured to detect a region of instability proximate to the surface wave plasma source in response to the information generated by the optical sensor.
A method for plasma processing comprising:
- generating a plasma field with a surface wave plasma source;
- generating information characteristic of optical energy collected in a region proximate to the surface wave plasma source with an optical sensor;
- and
- detecting, with a sensor logic unit, a region of instability proximate to the surface wave plasma source in response to the information generated by the optical sensor.
Dependencies are inferred from the claim text.