Multi charged particle beam writing apparatus and multi charged particle beam writing method

A multi charged particle beam writing apparatus comprising:

• a movable stage on which a substrate, serving as a writing target, is placed;
• an emitter emitting a charged particle beam;
• an aperture plate including a plurality of openings through which the charged particle beam passes to form multiple beams;
• a blanking plate including a plurality of blankers each performing blanking deflection on a corresponding one of the multiple beams;
• bitmap generation processing circuitry generating bitmap data for each writing pass of multi-pass writing, the bitmap data specifying irradiation time periods for a plurality of irradiation positions allocated to meshes obtained by virtually dividing a writing area of the substrate;
• a plurality of dose correction units configured to receive bitmap subdata items obtained by dividing the bitmap data from the bitmap generation processing circuitry, correct the irradiation time periods to generate a plurality of dose data items corresponding to respective processing ranges, and hold the plurality of dose data items;
• and
• data transfer processing circuitry transferring the plurality of dose data items generated or held by the plurality of dose correction units to the blanking plate through a plurality of signal line groups,
• wherein each of the signal line groups is used to transmit the dose data item for controlling the blankers located in a corresponding region of the blanking plate, and
• the data transfer processing circuitry changes the signal line groups, used to transfer the plurality of dose data items generated or held by the respective dose correction units, for each writing pass.