Process of forming a photoactive layer of an optoelectronic device
AssigneeCommonwealth Scientific and Industrial Research Organisation
InventorsTimothy William Jones, Gregory Joseph Wilson, Kenrick Forrest Anderson, Anthony Frank Hollenkamp, Noel William Duffy, Nienke Joan Firet
Life of this patent
Estimating the term…
Abstract
A process of forming a thin film photoactive layer of an optoelectronic device comprising: providing a substrate having a surface comprising or coated with a metal M selected from at least one of Pb, Sn, Ge, Si, Ti, Bi, or In; and converting the metal surface or metal coating of the substrate to a perovskite layer.
Claims21
-65. (canceled)
A process of forming a thin film photoactive layer of an optoelectronic device comprising:
- providing a substrate having a surface comprising or coated with a metal M selected from at least one of Pb, Sn, Ge, Si, Ti, Bi, or In;
- and
- converting the metal surface or metal coating of the substrate to a perovskite layer comprising an organo-metal halide perovskite.
Use of a substrate having a surface comprising or coated with a metal M selected from at least one of Pb, Sn, Ge, Si, Ti, Bi, or In to form a thin film photoactive layer comprising:
- converting the metal surface or metal coating of the substrate to a perovskite layer comprising an organo-metal halide perovskite.
An intermediate for use in forming a thin film photoactive layer of an optoelectronic device comprising a substrate having a surface comprising or coated with a metal M selected from at least one of Pb, Sn, Ge, Si, Ti, Bi, or In,
- wherein the metal surface or metal coating of the substrate is convertible to a perovskite layer comprising an organo-metal halide perovskite by applying at least one perovskite precursor thereto.
Dependencies are inferred from the claim text.