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US 2018/0004097 A1Published application
Exposure apparatus, movable body drive system, pattern formation apparatus, exposure method, and device manufacturing method
AssigneeNikon Corporation
InventorYuichi SHIBAZAKI
Life of this patent
Estimating the term…
Abstract
While a wafer stage moves linearly in a Y-axis direction, surface position information of a wafer surface at a plurality of detection points set at a predetermined interval in an X-axis direction is detected by a multipoint AF system, and by a plurality of alignment systems arranged in a line along the X-axis direction, marks at different positions on the wafer are each detected, and a part of a chipped shot of the wafer is exposed by a periphery edge exposure system. This allows throughput to be improved when compared with the case when detection operation of the marks, detection operation of the surface position information (focus information), and periphery edge exposure operation are performed independently.
Claims31
An exposure apparatus that exposes a substrate with an illumination light via a projection optical system and a liquid, the apparatus comprising:
- a mask stage system having a first stage and a first drive system, the first stage being disposed above the projection optical system and holding a mask illuminated with the illumination light, and the first drive system having a motor configured to drive the first stage;
- a nozzle member provided to surround a lens that is disposed closest to an image plane side, of a plurality of optical elements of the projection optical system, the nozzle member having a lower surface that is disposed lower than an emitting surface of the lens and forming a liquid immersion area with the liquid under the lens;
- a base member disposed below the nozzle member;
- a substrate stage system having two second stages and a second drive system, the two second stages being disposed on the base member and each holding a substrate, and the second drive system having a planar motor configured to drive the two second stages;
- and
- a controller coupled to the mask stage system and the substrate stage system, the controller controlling the first and the second drive systems so that scanning exposure in which the mask and the substrate are each moved relative to the illumination light with a first direction within a predetermined plane serving as a scanning direction is performed, and the predetermined plane being orthogonal to an optical axis of the projection optical system,
- wherein the controller:
- controls the second drive system so that the scanning exposure is performed via the projection optical system and the liquid of the liquid immersion area, from an area located on one side in the first direction, of a plurality of areas of a substrate held by one second stage of the two second stages that is placed facing the projection optical system, and
- controls the second drive system so that an other second stage of the two second stages comes close to the one second stage from an other side in the first direction, and the two second stages that have come close together are moved from the other side to the one side in the first direction, in order to place the other second stage to face the projection optical system instead of the one second stage while substantially maintaining the liquid immersion area under the lens.
6 more elements
An exposure method of exposing a substrate with an illumination light via a projection optical system and a liquid, the method comprising:
- holding a mask with a first stage disposed above the projection optical system;
- placing one second stage of two second stages to face the projection optical system, on a base member disposed below a nozzle member, the nozzle member being provided to surround a lens that is disposed closest to an image plane side, of a plurality of optical elements of the projection optical system, the nozzle member having a lower surface that is disposed lower than an emitting surface of the lens and forming a liquid immersion area with the liquid under the lens, and the two second stages each holding a substrate and being moved by a planar motor;
- moving the first stage and the one second stage so that scanning exposure is performed via the projection optical system and the liquid of the liquid immersion area, from an area located on one side in a first direction within a predetermined plane, of a plurality of areas of a substrate held by the one second stage, in the scanning exposure the mask and the substrate being each moved relative to the illumination light with the first direction serving as a scanning direction, and the predetermined plane being orthogonal to an optical axis of the projection optical system;
- moving an other second stage of the two second stages so that the other second stage comes close to the one second stage from an other side in the first direction;
- and
- moving the two second stages that have come close together from the other side to the one side in the first direction, in order to place the other second stage to face the projection optical system instead of the one second stage while substantially maintaining the liquid immersion area under the lens.
3 more elements
A making method of an exposure apparatus that exposes a substrate with an illumination light via a projection optical system and a liquid, the method comprising:
- providing a mask stage system having a first stage and a first drive system, the first stage being disposed above the projection optical system and holding a mask illuminated with the illumination light, and the first drive system having a motor configured to drive the first stage;
- providing a nozzle member to surround a lens that is disposed closest to an image plane side, of a plurality of optical elements of the projection optical system, the nozzle member having a lower surface that is disposed lower than an emitting surface of the lens and forming a liquid immersion area with the liquid under the lens;
- providing a base member disposed below the nozzle member;
- providing a substrate stage system having two second stages and a second drive system, the two second stages being disposed on the base member and each holding a substrate, and the second drive system having a planar motor configured to drive the two second stages;
- and
- providing a controller coupled to the mask stage system and the substrate stage system, the controller controlling the first and the second drive systems so that scanning exposure in which the mask and the substrate are each moved relative to the illumination light with a first direction within a predetermined plane serving as a scanning direction is performed, and the predetermined plane being orthogonal to an optical axis of the projection optical system,
- wherein the controller:
- controls the second drive system so that the scanning exposure is performed via the projection optical system and the liquid of the liquid immersion area, from an area located on one side in the first direction, of a plurality of areas of a substrate held by one second stage of the two second stages that is placed facing the projection optical system, and
- controls the second drive system so that an other second stage of the two second stages comes close to the one second stage from an other side in the first direction, and the two second stages that have come close together are moved from the other side to the one side in the first direction, in order to place the other second stage to face the projection optical system instead of the one second stage while substantially maintaining the liquid immersion area under the lens.
6 more elements
Dependencies are inferred from the claim text.