Illumination System for a Lithographic or Inspection Apparatus
AssigneeASML Netherlands B.V.
InventorsTeunis Willem TUKKER, Nitesh Pandey, Coen Adrianus Verschuren
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AssigneeASML Netherlands B.V.
InventorsTeunis Willem TUKKER, Nitesh Pandey, Coen Adrianus Verschuren
Estimating the term…
An illumination system has a microLED array 502. The microLED array 502 is imaged or placed very close to a phosphor coated glass disc 504 which upconverts the light from the microLED array into a narrow band emission. The plate has at least two different photoluminescent materials arranged to be illuminated by the microLED array and to thereby emit output light. The different photoluminescent materials have different emission spectral properties of the output light, e.g. different center wavelength and optionally different bandwidth. Illumination of different photoluminescent materials by the illumination sources is selectable, by selective activation of the microLEDs or by movement of the photoluminescent materials relative to the illumination sources, to provide different illumination of the different photoluminescent materials. This provides tunable spectral properties of the output light. Selectively configurable filters 506 are arranged to filter the output light in accordance with the selected illumination of the different photoluminescent materials.
-12. (canceled)
An illumination system for a lithographic or inspection apparatus, the system comprising:
An illumination system comprising:
An inspection apparatus comprising:
A lithographic apparatus comprising:
An inspection apparatus comprising:
A lithographic apparatus comprising:
Dependencies are inferred from the claim text.