Resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Koji Hasegawa, Masayoshi Sagehashi
Life of this patent
Estimating the term…
Abstract
A positive resist composition based on a polymer comprising recurring units (a) of (meth)acrylate having an iodized lactone ring, and recurring units (b1) having a carboxyl group substituted with an acid labile group and/or recurring units (b2) having a phenolic hydroxyl group substituted with an acid labile group has a high sensitivity and resolution, and forms a pattern of good profile and minimal edge roughness after exposure.
Claims9
A positive resist composition comprising a base resin containing a polymer comprising recurring units (a) having the formula (a), and recurring units (b1) having a carboxyl group whose hydrogen is substituted by an acid labile group and/or recurring units (b2) having a phenolic hydroxyl group whose hydrogen is substituted by an acid labile group, the polymer having a weight average molecular weight of 1,000 to 500,000,
- wherein RA is hydrogen or methyl, R1 is hydrogen or C1-C4 straight or branched alkyl, and R2 is a single bond or methylene.
Dependencies are inferred from the claim text.