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US 2018/0004080 A1Published application
Photomask layouts and methods of forming patterns using the same
AssigneeSamsung Display Co., Ltd.
InventorMan-Jong Yu
Life of this patent
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Abstract
A photomask layout includes: a substrate region; a lower stepped region at a region of the substrate region; and a pattern region at least partially crossing the lower stepped region and including at least one notch portion at an area overlapping the lower stepped region. A method of forming a pattern is also provided.
Claims8
A photomask layout comprising:
- a substrate region;
- a lower stepped region at a region of the substrate region;
- and
- a pattern region at least partially crossing the lower stepped region, the pattern region including at least one notch portion at an area overlapping the lower stepped region.
1 more element
Dependencies are inferred from the claim text.