Method for treating a semiconductor device
AssigneeLife Technologies Corporation
InventorsJames Ball, Brian Reed
Life of this patent
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Abstract
A sensor array includes a plurality of sensors. A sensor of the plurality of sensors has a sensor pad exposed at a surface of the sensor array. A method of treating the sensor array includes exposing at least the sensor pad to a wash solution including sulfonic acid and an organic solvent and rinsing the wash solution from the sensor pad.
Claims53
A method of treating a sensor array, the sensor array including a plurality of sensors, a sensor of the plurality of sensors having a sensor pad exposed at a surface of the sensor array, the method comprising:
- exposing at least the sensor pad to a wash solution including acid and an organic solvent;
- and
- rinsing the wash solution from the sensor pad.
The method of any one of claims 2-7 and 45-49, wherein the sulfonic acid includes methanesulfonic acid, ethanesulfonic acid, propane sulfonic acid, butane sulfonic acid, or combinations thereof.
The method of any one of claims 2-7 and 45-49, wherein the sulfonic acid includes dodecyl benzene sulfonic acid.
The method of any one of claims 2-7 and 45-49, wherein the sulfonic acid includes para toluene sulfonic acid.
The method of any one of claims 1-10 and 45-49, wherein the wash solution includes between 10 mM and 500 mM of the acid.
The method of any one of claims 1-10 and 45-49, wherein the wash solution includes between 0.5 wt % and 25 wt % of the acid.
The method of any one of claims 1-15 and 45-49, wherein the organic solvent is non-polar.
The method of any one of claims 1-16 and 45-49, wherein the organic solvent has a normal boiling point in a range of 36° C. to 345° C.
The method of any one of claims 1-20 and 45-49, wherein the organic solvent is an alkane having between 6 and 24 carbons.
The method of any one of claims 1-15 and 45-49, wherein the organic solvent is a polar aprotic solvent.
The method of any one of claims 1-26 and 45-49, further comprising heating the sensor pad and the wash solution while exposing the sensor pad to the wash solution.
The method of any one of claims 1-29 and 45-49, wherein exposing includes exposing for a period in a range of 30 seconds to 30 minutes.
The method of any one of claims 1-33 and 45-49, further comprising exposing at least the sensor pad to a basic solution.
The method of any one of claims 1-39 and 45-49, wherein rinsing includes rinsing with a rinse organic solvent miscible with water and the organic solvent.
The method of any one of claims 1-40 and 46-50, wherein rinsing includes rinsing with a low boiling organic solvent having a normal boiling point in a range of 25° C. to 100° C.
The method of any one of claims 1-44 and 46-50, wherein rinsing includes rinsing with water.
A method of treating a sensor array, the sensor array including a plurality of sensors, a sensor of the plurality of the sensors including a sensor pad, a well structure defining a well array corresponding with the sensor array, a well of the well array exposing the sensor pad, a cap attached over the sensor array and the well structure and including an fluid port, a space defined between the cap and the well structure, the method comprising:
- applying a wash solution through the fluid port into the space and waiting for a first period between 30 seconds and 30 minutes, the wash solution including acid and an organic solvent;
- applying a basic solution through the fluid port into the space and waiting for a second period between 20 seconds and 15 minutes;
- and
- applying a rinse solution through the fluid port.
A method of treating a sensor array, the sensor array including a plurality of sensors, a sensor of the plurality of the sensors including a sensor pad, a well structure defining a well array corresponding with the sensor array, a well of the well array exposing the sensor pad, the method comprising:
- applying a wash solution to at least the sensor pad and waiting for a first period between 30 seconds and 30 minutes, the wash solution including acid and an organic solvent;
- rinsing at least the sensor pad with a low boiling organic solvent;
- and
- drying the sensor array.
A solution comprising 2.5 wt % to 5 wt % dodecyl benzene sulfonic acid and a non-polar linear alkane having between 6 and 18 carbons.
A kit comprising:
- a nucleotide solution including at least one nucleotide type;
- polymeric particles;
- and
- a wash solution including 0.5 wt % to 20 wt % sulfonic acid and an organic solvent having a normal boiling point in a range of 65° C. to 275° C.
Dependencies are inferred from the claim text.